Plasma-Therm Unaxis 790

Models in this family

1. 

   790 RIE-PECVD

   The Plasma-Therm 790 RIE-PECVD is a single-chamber reactive ion etcher / plasma-enhanced chemical vapor deposition system.

2. 

   790 Series RIE

   The Plasma-Therm 790 Series RIE is a reactive ion etcher for 6-inch wafers.

3. Unaxis 790

   The Plasma-Therm Unaxis 790 is a reactive ion etcher / ICP plasma etch system used for etching polymer, dielectric, silicon, silicon oxide, and silicon nitride materials.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Unaxis 790 Middle	—	—	NIST identifies this as a specific NanoFab tool location/variant designation.	nist.gov[1]
   Unaxis 790 Right	—	—	NIST identifies this as a specific NanoFab tool location/variant designation.	nist.gov[2]
   Plasma-Therm Unaxis 790 Dual Chamber Shuttle Load Lock System	—	2001	Described as a dual chamber shuttle load lock system with PC controller, no endpoint detection, AE RF 5S generator, eight gas inputs, and loadlock.	capovani.com[3]
   Plasma-Therm Unaxis 790 DRIE PECVD	—	—	Described with DRIE and PECVD process capability and PC controller.	semistarcorp.com[4]

4. 

   Unaxis 790 RIE

   The Plasmatherm / Unaxis 790 RIE is a reactive ion etcher specified for 6-inch wafers.

Sources