Plasma-Therm
SLR 770 RIE
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Plasma-Therm SLR 770 RIE is a dual-chamber reactive ion etcher. The SLR 770 has a shuttle load lock and can process up to 8 inch wafers. The Plasma Therm SLR 770 dual chamber RIE has two chambers that support RIE or PE processing, with an adjustable top electrode gap, TMP turbo pumps, and eight gas lines with MFCs per chamber.[1][2]
What it is
How it works
General reference — not yet source-verifiedA reactive ion etcher uses a low-pressure plasma to combine chemical reaction and ion-assisted bombardment at the wafer surface.
A load-lock chamber isolates the process chamber from ambient air during wafer transfer and supports faster wafer handling between pump-down cycles.
Where it fits in the process flow
General reference — not yet source-verifiedThe Plasma-Therm SLR 770 RIE sits in the dry etch portion of the wafer flow, after pattern definition and before later device integration steps.
The Plasma-Therm SLR 770 RIE is used where patterned films or substrates require anisotropic material removal rather than wet chemical etching.
Applications
The Plasma-Therm SLR 770 RIE is used for reactive ion etching and plasma etching.[3][1]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- RF power supply has a water leak
What do the numbers mean?
Power & electrical4
- RF power supply has a water leak[3]
Vacuum & pumping1
Wafer handling2
- Dual chamber RIE with shuttle load lock[1]
Gas & chemistry1
Configuration & options3
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the SLR 770 RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SLR 770 RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SLR 770 RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SLR 770 RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the SLR 770 RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the SLR 770 RIE are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]semistarcorp.com — semistarcorp.comsemistarcorp.com
- [2]photonicmicrodevices.com — photonicmicrodevices.comphotonicmicrodevices.com
- [3]Inventory photo
Last updated Oct 12, 2026.
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