Tool family
Plasma-Therm SLR 770
Models in this family
The Plasma-Therm SLR 770 ICP Deep Silicon Etcher is a single-chamber inductively coupled plasma etcher configured for 4-inch wafers.
The Plasma-Therm SLR 770 Metal is a dual-chamber 4-inch metal etcher with load-locked sample introduction and turbomolecular pumping.
The Plasma-Therm SLR 770 is a reactive ion etcher.
The Plasma-Therm SLR-770 ICP is a chlorine etcher configured as an inductively coupled plasma etch system with vacuum load lock and wafer transfer robot.
All entries
- SLR 770 ICP Deep SiliconPlasma-Therm
The Plasma-Therm SLR 770 ICP Deep Silicon Etcher is a single-chamber inductively coupled plasma etcher configured for 4-inch wafers.
CategoryEtch19 specs - SLR 770 MetalPlasma-Therm
The Plasma-Therm SLR 770 Metal is a dual-chamber 4-inch metal etcher with load-locked sample introduction and turbomolecular pumping.
CategoryEtch5 specs - SLR 770 RIEPlasma-Therm
The Plasma-Therm SLR 770 is a reactive ion etcher.
CategoryEtch3 specs - SLR-770Plasma-Therm
The Plasma-Therm SLR-770 ICP is a chlorine etcher configured as an inductively coupled plasma etch system with vacuum load lock and wafer transfer robot.
CategoryEtchWafer2"12 specs