Waferpedia

PVA TePla

GigaBatch

Etch75 mm to 100 mmPVA TePla GigaBatch family
Research Quality: 40% complete
GigaBatch — epfl.ch
Fig. 01GigaBatchepfl.ch[1]
  • Plate 01PVATepla GIGABatch 360M O2 PLASMA power on DV

    瀚柏科技 CO., LTDWatch on YouTube
  • Plate 02穎強科技-PVA TePla 微波電漿清洗機 GIGAbatch 360 380P 介紹

    Afen LiuWatch on YouTube

Wafer size

75 mm to 100 mm

Vacuum

Quartz primary vacuum chamber[1]

Gas delivery

O2[1]

What is it?

The Tepla GiGAbatch uses high-frequency plasma and is described as a gold-free tool for wafer processing. Its listed main applications are photoresist stripping, wafer surface cleaning before subsequent processes, and descumming before wet etching. The equipment description states a quartz primary vacuum chamber, 2.45 GHz plasma frequency, 200 to 600 W plasma power, O2 gas, and quartz holders for 25 wafers from 75 mm to 100 mm.

What can it run?

Process applications and technology nodes documented for this tool.

  • Photo resist stripping
  • Wafer surface cleaning before subsequent processes
  • Descumming before wet etching

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Gold must not be loaded in the tool, even if covered and protected.
  • Ag, Cu, Cr, and Fe are not welcome in the tool.
  • Materials that deteriorate easily upon exposure to oxygen should not be processed in the machine.

What do the numbers mean?

Vacuum & pumping2

Primary vacuum chamber
Quartz primary vacuum chamber[1]
Accurate?
Primary vacuum chamber dimensions
D int. 245 mm x Prof. 380 mm[1]
Accurate?

Wafer handling2

Wafer capacity
25 wafers[1]
Accurate?
Wafer size range
75 mm to 100 mm[1]
Accurate?

Gas & chemistry1

Gas
O2[1]
Accurate?

Configuration & options4

Plasma type
High frequency plasma[1]
Accurate?
Plasma frequency
2.45 GHz[1]
Accurate?
Plasma power
200 to 600 W[1]
Accurate?
O2 maximum flow
1000 ml/min[1]
Accurate?
Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • GasO2[1]
  • Primary vacuum chamberQuartz primary vacuum chamber[1]
  • Primary vacuum chamber dimensionsD int. 245 mm x Prof. 380 mm[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the GigaBatch are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the GigaBatch are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the GigaBatch are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the GigaBatch are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the GigaBatch is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the GigaBatch are on record.

    Answerable by: an OEM parts catalog or a service engineer

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.chepfl.ch
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Last updated Jul 29, 2026.

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