PVA TePla

Wafer size
75 mm to 100 mm
Gas delivery
O2 (max. flow 500 ml/min)[1]
Process applications and technology nodes documented for this tool.
Documented failure modes, common issues, and field considerations.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the 300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 300 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 300 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 300 are on record.
Answerable by: an OEM parts catalog or a service engineer
Last updated Jul 29, 2026.
The Tepla GiGAbatch is a high-frequency plasma tool used for photoresist stripping, wafer surface cleaning, and descumming before wet etching.
The Tegal 1511e is a tri-electrode dual-frequency plasma etch system for processing three- to six-inch wafers.
General referenceLam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.