Waferpedia

PVA TePla

300

Etch75 mm to 100 mmPVA TePla 300 family
Research Quality: 40% complete
300 — epfl.ch
Fig. 01300epfl.ch[1]

Wafer size

75 mm to 100 mm

Gas delivery

O2 (max. flow 500 ml/min)[1]

What is it?

The Tepla 300 uses high-frequency plasma with a quartz primary vacuum chamber, 2.45 GHz plasma frequency, and 200 to 1000 W plasma power. It is described as not micro-electronic compatible and is used for photoresist stripping, wafer surface cleaning before subsequent processes, and enhancing the hydrophilic behavior of plastics surfaces.

What can it run?

Process applications and technology nodes documented for this tool.

  • Photo Resist (PR) stripping
  • Wafers surface cleaning before subsequent processes
  • Enhancement of hydrophilic behavior of plastics surfaces

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Materials that deteriorate easily upon exposure to oxygen, including Ag, Cu, Cr, and Fe, should not be processed in this machine.

What do the numbers mean?

Vacuum & pumping1

Chamber
Quartz primary vacuum chamber, Dint. 245 mm x Prof. 380 mm[1]
Accurate?

Wafer handling2

Wafer capacity
Quartz holders for 25 wafers[1]
Accurate?
Wafer size range
75 mm to 100 mm[1]
Accurate?

Gas & chemistry1

Gas
O2 (max. flow 500 ml/min)[1]
Accurate?

Configuration & options4

Plasma type
High frequency plasma[1]
Accurate?
Plasma frequency
2.45 GHz[1]
Accurate?
Plasma power
200 to 1000 W[1]
Accurate?
Micro-electronic compatibility
Not micro-electronic compatible[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • GasO2 (max. flow 500 ml/min)[1]
  • ChamberQuartz primary vacuum chamber, Dint. 245 mm x Prof. 380 mm[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the 300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 300 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 300 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 300 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the 300 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 300 are on record.

    Answerable by: an OEM parts catalog or a service engineer

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.chepfl.ch
  2. [2]Dry Etchingtudelft.nltudelft.nl
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Last updated Jul 29, 2026.

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