SUSS MicroTec

MA 8 BA 8 Gen 5 S Compact Mask

Lithography SUSS MicroTec MA 8 Mask family

Research Quality: 20% complete

LinkedIn X Email

MA 8 BA 8 Gen 5 S Compact Mask — Inventory photo — Fig. 01MA 8 BA 8 Gen 5 S Compact MaskInventory photo^[1]

Power

3x 400V AC + N + PE / 50-60Hz^[1]

Vacuum

Vacuum:^[1]

What is it?

What do the numbers mean?

Power & electrical3

Power supply: 3x 400V AC + N + PE / 50-60Hz^[1]; Voltage/Frequency:^[1]; 200-240 V, L1/N/PE, or L1/L2/PE, 50/60hz^[1]

Vacuum & pumping1

Vacuum:^[1]

Accurate?

Dimensions & facilities2

Clean Dry Air (CDA):^[1]
CDA Consumption: ca. 1 m3/h (LH350)^[1]

Configuration & options14

For imprint processing^[1]
Max fuse rating machine: 30amp^[1]
Max fuse rating facility: 40amp^[1]
Connection cable: 5x AWG8 length 16ft / 5m open end, no connector^[1]; <-80 kPa^[1]
Outer tube diameter: 6mm^[1]
Max length: 2m^[1]; 0,5 to 0,8 MPa^[1]
According to purity level ISO 8573-1: 2010, [5:6:4]^[1]; Nitrogen (N2):^[1]; 0,2 to 0,5 MPa^[1]
AIC or main interrupt and breakers: 15 kA IEC^[1]; SCCR (Short Circuit Current Rating) of overall equipment: 5 kA^[1]; Apparent Power:^[1]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
MA 8 / BA 8 Gen 5 S	Gen 5 S	—	—	Equipment inventory listing^[1]

Interested in this tool?

Embed spec card

What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

KLA ICOS CI 8 X 50 Lead— Same function class: Lithography, UnknownCompare in depthsource^[2]
Quintel Q 7000 Mask— Same function class: Lithography, UnknownCompare in depthsource^[3]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Power supply3x 400V AC + N + PE / 50-60Hz^[1]
ConfigurationVacuum:^[1]
ConfigurationVoltage/Frequency:^[1]
Configuration200-240 V, L1/N/PE, or L1/L2/PE, 50/60hz^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What is the MA 8 / BA 8 Gen 5 S Compact Mask Aligner used for?

It is for imprint processing.^[1]

Not publicly documented

The following facts about the MA 8 BA 8 Gen 5 S Compact Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 8 BA 8 Gen 5 S Compact Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MA 8 BA 8 Gen 5 S Compact Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 8 BA 8 Gen 5 S Compact Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 8 BA 8 Gen 5 S Compact Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 8 BA 8 Gen 5 S Compact Mask are on record.
Answerable by: an OEM parts catalog or a service engineer