SUSS MicroTec
MA 8 BA 8 Gen 5 S Compact Mask
What it is
How it works
General reference — not yet source-verifiedA mask aligner positions a photomask or imprint template with a substrate before exposure or transfer of a patterned layer.
Mask aligners use controlled mechanical alignment, vacuum handling, and gas services to hold and position process parts during lithography work.
Where it fits in the process flow
Applications
What do the numbers mean?
Power & electrical5
Vacuum & pumping2
- Vacuum:[1]
Optics & imaging1
Dimensions & facilities4
- Clean Dry Air (CDA):[1]
Configuration & options20
- For imprint processing[1]
- <-80 kPa[1]
- 0,5 to 0,8 MPa[1]
- Nitrogen (N2):[1]
- 0,2 to 0,5 MPa[1]
- SCCR (Short Circuit Current Rating) of overall equipment: 5 kA[1]
- Apparent Power:[1]
- Apparent power
- ca. 1,7 kVA max, inc. CIC1200 and 350 W lamp; ca. 1,0 kVA max, Bond Aligner without lamp[1]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MA 8 / BA 8 Gen 5 S | Gen 5 S | — | — | Equipment inventory listing[1] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- KLA ICOS CI 8 X 50 Lead— Same function class: Lithography, UnknownCompare in depthsource[2]
- Quintel Q 7000 Mask— Same function class: Lithography, UnknownCompare in depthsource[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 8 BA 8 Gen 5 S Compact Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 8 BA 8 Gen 5 S Compact Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MA 8 BA 8 Gen 5 S Compact Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 8 BA 8 Gen 5 S Compact Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 8 BA 8 Gen 5 S Compact Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 8 BA 8 Gen 5 S Compact Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
- [3]Equipment inventory listing
- [4]MA 8 BA 8 Gen 5 S Compact Mask — SUSS MicroTec | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [5]Karl Suss MA 8/BA 8 Gen 5S Compact Mask Aligner | SemiStar — semistarcorp.comsemistarcorp.com
Last updated Oct 13, 2026.
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KLA ICOS CI 8 X 50 Lead is a lead scanner described with 3.4 kW power and related operating requirements.
The Quintel Q 7000 Mask is a mask aligner used for lithography.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.