EV Group
620 Mask
The EVG 620 is a mask aligner manufactured by EV Group. The EVG 620 supports wafer sizes from 2 to 12 inches. Some configurations of the EVG 620 include backside alignment and infrared alignment.[1]
Wafer size
3 Station Wafer Handler
Power
200 V[2]
Vacuum
6 bar / 87 psi[3]
Performance
Backside Alignment Capability[1]
Optics
620 Mask[2]
What it is
General reference — not yet source-verifiedThe EV Group 620 Mask is a mask aligner used in lithography for semiconductor processing.
How it works
General reference — not yet source-verifiedA mask aligner aligns a photomask to a wafer before exposing the wafer to patterned light.
A mask aligner is used to transfer circuit or feature patterns from a mask into a photoresist-coated wafer surface.
Where it fits in the process flow
General reference — not yet source-verifiedMask alignment is a front-end lithography step that occurs before development and later pattern transfer steps.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Joystick and numeric keypad have been removed
What do the numbers mean?
Power & electrical7
- 50 / 60 Hz[2]
Vacuum & pumping7
Wafer handling6
- 6"; Chuck is 5"[1]
Optics & imaging2
Performance5
Control & software2
- Computer / Controller[1]
Configuration & options13
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Quintel Q 7000 Mask— Same function class: Lithography, UnknownCompare in depthsource[7]
- KLA ICOS CI 8 X 50 Lead— Same function class: Lithography, UnknownCompare in depthsource[8]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Voltage200 V[2]
- Configuration50 / 60 Hz[2]
- Voltage208V, 1-phase, GND – 3 wire[3]
- Frequency50/60 Hz[3]
- Power consumption1.55 kW[3]
- Compressed Air (CDA)6 bar / 87 psi[3]
- Nitrogen or CDA6 bar / 87 psi[3]
- Vacuum< 850 mbar / 6460 torr[3]
- Voltage208 V[1]
- Vacuum< 850 mbar / 6460 torr[3]
- Voltage208 V, 1-phase (or 200 V, 2-phase)[3]
- Compressed air (CDA) supply6 bar / 87 psi[3]
- Nitrogen or CDA supply6 bar / 87 psi[3]
- Vacuum requirement< 850 mbar / 6460 torr[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What are the electrical requirements for the EVG 620?
The EVG 620 can be configured for 208 V, 1-phase, 50/60 Hz operation with a full load current rating of 7.45 A and power consumption of 1.55 kW. Other configurations may use 200 V, 2-phase, 50/60 Hz with a current rating of 10 A.[2][3]
What compressed air and vacuum levels are needed for the EVG 620?
The EVG 620 requires compressed air (CDA) at 6 bar (87 psi) and vacuum below 850 mbar (6460 torr).[3]
Not publicly documented
The following facts about the 620 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 620 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 620 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 620 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 620 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 620 Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (10)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]Inventory photo
- [7]Equipment inventory listing
- [8]Equipment inventory listing
- [9]Equipment inventory listing
- [10]Equipment inventory listing
Last updated Oct 13, 2026.
Compare with similar tools
View all →
KLA ICOS CI 8 X 50 Lead is a lead scanner described with 3.4 kW power and related operating requirements.
The Quintel Q 7000 Mask is a mask aligner used for lithography.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
