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Semitool

270

Wet chemistry3"Semitool 270 family
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Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Wafer size

3"

Gas delivery

heated nitrogen[1]

What it is

The Semitool 270 is a spin rinser/dryer used in wet chemistry processing.[1][2]

How it works

It rinses substrates in deionized water to 15 MΩ and dries them with heated nitrogen.[1]

Where it fits in the process flow

The tool accepts 3-inch, 4-inch, and 6-inch wafer boats.[1]

What can it run?

Process applications and technology nodes documented for this tool.

  • Rinsing substrates in DI water
  • Drying substrates with heated nitrogen

What do the numbers mean?

Wafer handling1

Wafer boats
3", 4", and 6"[1]
Accurate?

Gas & chemistry1

Drying gas
heated nitrogen[1]
Accurate?

Configuration & options3

Type
Spin Rinser/Dryer[1]
Accurate?
Rinse medium
DI water[1]
Accurate?
Rinse resistivity
to 15 Ma9[1]
Accurate?
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What replaced it?

  • siblingSemitool 870— Listed alongside the Semitool 870 in the wet chemistry equipment list.source[2]
  • siblingSemitool 880— Listed alongside the Semitool 270 as a Spin Rinser/Dryer in the wet chemistry equipment list.source[2]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Drying gasheated nitrogen[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What type of equipment is the Semitool 270?

It is a spin rinser/dryer used in wet chemistry processing.[1][2]

How does it rinse and dry substrates?

It rinses substrates in deionized water to 15 MΩ and dries them with heated nitrogen.[1]

Not publicly documented

The following facts about the 270 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 270 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 270 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 270 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 270 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 270 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edu — nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]Equipment - Claire & John Bertucci Nanotechnology Laboratory - College of Engineering - Carnegie Mellon University — nanofab.ece.cmu.edunanofab.ece.cmu.edu
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Last updated Jul 27, 2026.