Sumitomo
SEN NV GSD III 180 High Current Ion
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is used after a wafer has received prior films or patterned masking layers that define where dopants will enter the substrate. Ion implantation is followed by thermal steps that activate dopants and repair crystal damage, and the implanted regions then feed into later device fabrication steps such as contact formation and interconnect build.
Applications
General reference — not yet source-verifiedHigh current ion implanters are used for dopant introduction in semiconductor device fabrication. Typical applications include source and drain formation, well engineering, contact-related implants, and other process stages where controlled dose placement in selected regions of the wafer is required.
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
What kind of equipment is the Sumitomo SEN NV GSD III 180?
The Sumitomo SEN NV GSD III 180 is a high current ion implanter.[1][2]
What wafer size is the Sumitomo SEN NV GSD III 180 configured for?
The Sumitomo SEN NV GSD III 180 is configured for 6 inch wafers.[1][2]
Not publicly documented
The following facts about the SEN NV GSD III 180 High Current Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SEN NV GSD III 180 High Current Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SEN NV GSD III 180 High Current Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SEN NV GSD III 180 High Current Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SEN NV GSD III 180 High Current Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SEN NV GSD III 180 High Current Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 20, 2026.
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