SUSS MicroTec
MA 150 E
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The MA 150 E is a 6-inch (150 mm) automatic mask aligner from SUSS MicroTec. The MA 150 E offers UV400 optics with exposure at 365 nm and 405 nm. The MA 150 E is typically equipped with a 1000 watt lamphouse.[1][2]
Power
1000 Watt[2]
Vacuum
Hard, Soft, Proximity, Vacuum Contact[2]
Performance
< 1.0 µm[1]
Optics
UV400 (365nm/405nm)[1]
What it is
The SUSS MicroTec MA 150 E is an automatic mask aligner used for lithography. The MA 150 E is a 6-inch mask aligner from the SUSS MicroTec MA 150 family. The MA 150 E can be configured with wafer thickness measurement and related alignment accessories. The MA 150 E can be used in either automatic or manual mode and supports cassette-to-cassette operation. The MA 150 E belongs to SUSS MicroTec's line of automatic mask aligners for wafers up to 150 mm.[4][1]
How it works
The MA 150 E is an automatic mask aligner with Topside Alignment (TSA). The MA 150 E can use AL3000 automatic alignment and Cognex 8100 pattern recognition software to align the mask to substrate patterns automatically. The MA 150 E can align patterns of nearly any shape or design with alignment accuracies of less than 1.0 µm. The MA 150 E can be used in automatic or manual mode and can include an XRS prealigner. The MA 150 E can include an auto-align option.[1]
Exposure on the MA 150 E can use UV400 optics for 365 nm and 405 nm wavelengths and a 1000-watt lamphouse. The MA 150 E can use a CIC1200 power supply. The MA 150 E supports hard, soft, proximity, and vacuum contact exposure modes with appropriate tooling. The MA 150 E can be fitted with a single objective at 5x, 10x, or 20x magnification. The MA 150 E can be equipped with a DVM6 microscope and a Windows 2000-based control system.[1]
Where it fits in the process flow
Applications
The MA 150 E belongs to a mask-aligner family aimed at lithography for MEMS, advanced packaging, three-dimensional packaging, compound semiconductors, power devices, photovoltaics, nanotechnology, and wafer-level optics. The MA 150 E can be configured with wafer thickness measurement and topside alignment. The MA 150 E supports hard, soft, proximity, and vacuum contact exposure modes, allowing the exposure method to be matched to the resist and substrate conditions.[4][1]
What do the numbers mean?
Power & electrical2
Vacuum & pumping1
Wafer handling1
Optics & imaging1
Performance1
Control & software1
Configuration & options3
- Refurbished[3]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the MA 150 E handle?
The MA 150 E is a 6-inch mask aligner that handles wafers up to 150 mm.[4][1]
What exposure modes does the MA 150 E support?
The MA 150 E is capable of hard, soft, proximity, and vacuum contact exposure modes with appropriate tooling.[1]
Does the MA 150 E support automatic alignment?
The MA 150 E is an automatic mask aligner with Topside Alignment (TSA), AL3000 automatic alignment, and Cognex 8100 pattern recognition software for automatic alignment of the mask to substrate patterns. The MA 150 E can align patterns of nearly any shape or design with alignment accuracies of less than 1.0 µm.[1]
What exposure optics does the MA 150 E use?
The MA 150 E can use UV400 optics for 365 nm and 405 nm exposure wavelengths, a 1000-watt lamphouse, and a CIC1200 power supply.[1]
Can the MA 150 E run in automatic and manual modes?
The MA 150 E can be used in either automatic or manual mode and supports cassette-to-cassette operation.[1]
What control and inspection hardware does the MA 150 E use?
The MA 150 E can be equipped with a DVM6 microscope and an XRS prealigner, and its control software can run under the Windows 2000 operating system.[1]
Not publicly documented
The following facts about the MA 150 E are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 150 E are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 150 E are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 150 E are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 150 E are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 150 E is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]classoneequipment.com — classoneequipment.comclassoneequipment.com
- [3]inventory listing
- [4]web.archive.org — suss.com (Jul 21, 2010)web.archive.org
Last updated Sep 24, 2026.
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