SUSS MicroTec
MA 200
What it is
How it works
For the MA 200, the listed equipment configurations include optical and control components such as lenses, mirrors, a lamp, a monitor, a display, a focus controller, a fixed blanket, a cover, a cable duct, and a video control unit.[1]
Applications
General reference — not yet source-verifiedThis class of tool is used for photolithographic patterning in semiconductor and microfabrication work, including device fabrication, process development, and small-volume production where precise mask-to-wafer alignment is needed.
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- AZ 4330 full data sheetDatasheetasu.edu
- AZ P4620 Positive PhotoresistDocumentutoronto.ca
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does a lithography system do?General reference — not yet source-verified
It transfers a pattern from a mask into a photosensitive layer on a substrate so that the pattern can be developed and used in later fabrication steps.
Where is this class used in process flow?General reference — not yet source-verified
It is used early in the fabrication sequence, after surface preparation and resist coating and before pattern transfer or material removal steps.
What kinds of processes use this class of machine?General reference — not yet source-verified
It is used in microfabrication processes that require precise feature definition, including electronic, photonic, and microstructured device manufacturing.
Why is alignment important in this class of equipment?General reference — not yet source-verified
Alignment ensures that the exposed pattern is registered correctly to existing features or to the substrate layout, which is essential for device accuracy and layer-to-layer overlay.
What is the main output of the lithography step?General reference — not yet source-verified
The output is a patterned resist image that serves as the template for the next manufacturing operation.
Not publicly documented
The following facts about the MA 200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
- [4]Equipment inventory listing
- [5]Equipment inventory listing
- [6]AZ 4330 full data sheet — cores.research.asu.educores.research.asu.edu
- [7]AZ P4620 Positive Photoresist — ece.utoronto.caece.utoronto.ca
- [8]3D Lithography: SUSS MicroTec — suss.com (Jan 21, 2012)web.archive.org
Last updated Jul 29, 2026.
