SUSS MicroTec
MA 8 Gen 3 Mask
What it is
The SUSS MicroTec MA 8 Gen 3 Mask Aligner is a mask aligner for semiconductor lithography. It is configured for 8-inch wafers and uses TSA alignment, with a slide-in pneumatic locking SQR 9 mask holder and no backside alignment.[2]
How it works
General reference — not yet source-verifiedIn mask-aligner lithography, the wafer is placed in the exposure position, the mask is brought into alignment with the wafer, and the pattern is exposed through the mask onto a photoresist-coated surface. Alignment accuracy depends on the tool's mechanical positioning and optical alignment method.
Where it fits in the process flow
General reference — not yet source-verifiedMask alignment and exposure occur after wafer preparation and photoresist coating, and before resist development and subsequent etch, deposition, or lift-off steps that transfer the pattern into the underlying material.
Applications
General reference — not yet source-verifiedMask aligners are used for photolithographic patterning in semiconductor and microfabrication work, especially where direct alignment of a mask to a wafer is required.
What do the numbers mean?
Optics & imaging2
- Slide-in pneumatic locking SQR 9 mask holder[2]
Performance2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 8 Gen 3 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 8 Gen 3 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 8 Gen 3 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 8 Gen 3 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 8 Gen 3 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 8 Gen 3 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]inventory listing
Last updated Jul 29, 2026.
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