SUSS MicroTec
Plate 01Suss MJB3 350W Mask Aligner (ID 3885)
Plate 02Karl Suss MJB-3 HP/ST Inv# 59511
Plate 03Karl Suss MJB3 Mask Aligner #60007
Plate 04Suss MJB3 350W BSA IR Mask Aligner (ID# 3845)
Plate 05Karl Suss MJB3 UV Intensity Measurement and Verification Supplement
Plate 06MNTL Karl Suss MJB3 Aligner training
Plate 07Suss MJB3 Mask Aligner at ClassOne Equipment!
The SUSS MicroTec MJB-3 is a mask aligner used for photolithographic patterning.[1]
In mask alignment lithography, a masked pattern is aligned to the substrate and exposed to light so the resist can be selectively changed. The exposure step is followed by downstream resist processing to leave the desired pattern on the wafer or other substrate.
The MJB-3 is used for photolithographic patterning in device and microstructure fabrication.[1]
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It is a mask aligner for photolithographic patterning.[1]
It is used for photolithographic patterning in fabrication workflows.[1]
It is part of the lithography tool set in a nanofabrication environment.[2]
The following facts about the MJB-3 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MJB-3 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MJB-3 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MJB-3 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MJB-3 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MJB-3 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Jul 29, 2026.