Ultratech
LSA 100 A Wafer
The Ultratech LSA 100 A Wafer is a lithography tool. The Ultratech LSA 100 A Wafer is a wafer stepper. The Ultratech LSA 100 A Wafer uses Laser Spike Anneal (LSA).[1][2]
What it is
How it works
The Ultratech LSA 100 A Wafer includes a process chamber, a cooling chamber, a laser, a heat exchanger, and an AC rack. The Ultratech LSA 100 A Wafer is configured for 115 VAC, single phase, at 50/60 Hz. The Ultratech LSA 100 A Wafer is specified at 15 amps FLA with a 6 amp largest load. The Ultratech LSA 100 A Wafer uses a 2 wire plus ground electrical connection.[2][1]
Where it fits in the process flow
General reference — not yet source-verifiedLithography-class wafer tools are used in patterned device manufacturing where precise, localized optical processing is required. Such tools are integrated into process flows alongside resist preparation, alignment or positioning, optical treatment, and subsequent inspection or downstream thermal and material steps. Laser-based wafer processing equipment is generally placed where selective surface treatment must be tightly coordinated with substrate handling and process control.
Applications
General reference — not yet source-verifiedStepper and laser-based wafer tools are used in semiconductor fabrication for pattern-related optical processing and other localized wafer treatments. Such equipment is applied where process uniformity, positioning accuracy, and controlled energy delivery are important to device formation. In fab practice, these tools support wafer-level processing tasks that interact with surrounding lithography, thermal, and integration steps.
What do the numbers mean?
Power & electrical4
- 15 Amps FLA / 6 Amps Largest Load[2]
Wafer handling1
Optics & imaging5
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the primary optical technology of the LSA 100 A?
The system uses laser spike anneal (LSA) as part of its optics and imaging subsystem.[1]
Not publicly documented
The following facts about the LSA 100 A Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the LSA 100 A Wafer are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the LSA 100 A Wafer are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the LSA 100 A Wafer are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the LSA 100 A Wafer are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the LSA 100 A Wafer is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
Last updated Oct 19, 2026.
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