Waferpedia

Ulvac

NE-550

EtchUlvac NE-550 family
Research Quality: 40% complete
NE-550 — nanolab.ucla.edu
Fig. 01NE-550nanolab.ucla.edu[1]
  • Plate 01Model:NE-550 高密度プラズマエッチング装置 - 研究開発向けの最適なソリューション

    アルバックテクノ株式会社Watch on YouTube

What is it?

The sources identify the Ulvac NE-550 as an etching tool in UCLA Nanolab's equipment list and describe it as a multipurpose high-density, low-pressure plasma etching system with good uniformity and repeatability. It is stated to be capable of etching III-V materials, metals, ceramics, and optical materials.

What can it run?

Process applications and technology nodes documented for this tool.

  • Chlorine etching
  • Etching III-V materials
  • Etching metals
  • Etching ceramics
  • Etching optical materials

What do the numbers mean?

Vacuum & pumping1

System type
Multipurpose high-density, low-pressure plasma etching system[2]
Accurate?

Optics & imaging1

Materials etched
III-V, metals, ceramics, and optical materials[2]
Accurate?

Performance1

Performance note
Good uniformity and repeatability[2]
Accurate?

Configuration & options1

Equipment name
Ulvac NE-550 Chlorine Etcher[2]
Accurate?
Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • System typeMultipurpose high-density, low-pressure plasma etching system[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the NE-550 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NE-550 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the NE-550 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the NE-550 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the NE-550 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the NE-550 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]nanolab.ucla.edunanolab.ucla.edunanolab.ucla.edu
  2. [2]nanolab.ucla.edunanolab.ucla.edunanolab.ucla.edu
  3. [3]Equipment | UCLA Nanolabnanolab.ucla.edunanolab.ucla.edu
  4. [4]High-Density Plasma Etching System NE-550 | ULVAC GmbHulvac.euulvac.eu
  5. [5]Ulvac NE-550microsystems.orgmicrosystems.org
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →