Varian

The Varian EHP 500 Ion is an ion implanter used for ion implantation in semiconductor manufacturing.[1][3]
An ion implanter accelerates ions and directs them into a wafer surface to modify material properties near the surface.
Ion implantation is a doping and modification step in the semiconductor process flow.
Ion implantation is used to introduce controlled dopants into semiconductor wafers and to adjust near-surface electrical properties.
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Implantation is commonly performed after masking layers and patterned openings have been created by deposition, lithography, and etch. After the implant, wafers typically proceed to cleaning and thermal treatment so that dopants become electrically active and lattice damage is reduced.
The following facts about the EHP 500 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EHP 500 Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EHP 500 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EHP 500 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EHP 500 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EHP 500 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 16, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.