Veeco

AP 300 E Lithography

Lithography Warped Wafer Handling to 500 um Veeco AP 300 E Lithography family

Research Quality: 20% complete

LinkedIn X Email

Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Wafer size

Warped Wafer Handling to 500 um

Power

208 V three phase, 5 wire, 150 amp^[1]

Optics

MVS Alignment Spectrum of 530 - 570 nm^[1]

What is it?

The Veeco AP 300 E Lithography System is a lithography tool with 2.0 µm resolution, extended-field ghi-line broadband optics, and handling features for 200 mm and 300 mm wafers including warped wafer handling to 500 µm.

What do the numbers mean?

Power & electrical2

2.0 um Resolution, Extended Field, ghi-line Broadband Lens Dual 1200 Watt Lamp llluminator^[1]
Power Source: 208 V three phase, 5 wire, 150 amp^[1]

Wafer handling5

Universal Size/Warped Wafer Kit: 200 mm and 300 mm^[1]
Wafer size: Warped Wafer Handling to 500 um^[1]
Wafer size: FOUP Wafer Handling^[1]
Wafer size: Wafer Thickness Handling from 0.4 mm to 2.0 mm PATMAX MVS Alignment System^[1]; Open Cassette Adapter (QTY 2)^[1]

Optics & imaging6

Lens Distortion Reference - No lens matching - Closed Loop Cooler^[1]

Accurate?

Lens Protection (Requires Closed Loop Cooler)^[1]

Accurate?

MVS Alignment Spectrum of 530 - 570 nm^[1]

Accurate?

6 Slot Reticle Stack, Manual Front Loading^[1]

Accurate?

6 x 6 x 0.25 inch Reticle Type^[1]

Accurate?

Edge Exposure System (WEE 3)^[1]

Accurate?

Dimensions & facilities1

Edge Exclusion System with one Exclusion Ring Specify exclusion ring width 1 - 5 mm protection available^[1]

Accurate?

Configuration & options6

68 x 26 mm Field Size^[1]
Dual Flip Aperture: ([68mm/44mm/34.2mm] x 26mm)^[1]; Enhanced Bottom Pellicle^[1]; Environmental Chamber, Shipped From Supplier (White)^[1]; GEM HSMS Communications^[1]; ghi-line Auto Filter Changer^[1]

Interested in this tool?

Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Configuration2.0 um Resolution, Extended Field, ghi-line Broadband Lens Dual 1200 Watt Lamp llluminator^[1]
Power Source208 V three phase, 5 wire, 150 amp^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the AP 300 E Lithography are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AP 300 E Lithography are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the AP 300 E Lithography are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the AP 300 E Lithography are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the AP 300 E Lithography are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the AP 300 E Lithography is not on record.
Answerable by: an OEM datasheet or a fab qualification report