YES
310TA
The YES 310TA is a vacuum cure and HMDS vapor prime oven for enhancing photoresist adhesion. The YES 310TA operates at 150°C with a 300-second HMDS vapor exposure. The YES 310TA treats wafers up to 6 inches in diameter.[1][2]
What it is
General reference — not yet source-verifiedHMDS vapor prime ovens are thermal processing tools used in lithography preparation. HMDS vapor prime ovens promote resist adhesion by conditioning substrate surfaces before coating. Batch ovens of this class process multiple substrates together in a controlled chamber rather than priming each substrate individually.
Applications
General reference — not yet source-verifiedTools in this class are used wherever a coated polymer film must adhere reliably during later pattern transfer. Typical uses include resist processing for microfabrication on silicon, dielectric, nitride, and metal-bearing substrates. Vapor priming is also used in workflows that prepare surfaces for specialty polymer coatings and related surface-modification steps.
- Batch priming of Si, native or film SiO2, and Si3N4
- Enhancing adhesion of polymers such as photoresists
- HMDS treatment before spin coating
What do the numbers mean?
Vacuum & pumping2
Wafer handling8
Optics & imaging2
Configuration & options12
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| YES-310TA | — | — | — | web.archive.org[4] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What treatment does the YES 310TA perform?
The YES 310TA performs vacuum cure and HMDS vapor priming for adhesion promotion before photoresist coating.[1][3]
Not publicly documented
The following facts about the 310TA are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 310TA are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 310TA are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 310TA are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 310TA is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 310TA are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]epfl.ch — epfl.chepfl.ch
- [2]colorado.edu — colorado.educolorado.edu
- [3]nist.gov — nist.govnist.gov
- [4]web.archive.org — web.archive.orgweb.archive.org
- [5]Capabilities | UD Nanofabrication Facility — udnf.udel.eduudnf.udel.edu
Last updated Oct 20, 2026.
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