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G 1000 LMC

Wet Processing / CleanYES G 1000 LMC family
Research Quality: 30% complete
G 1000 LMC — Inventory photo
Fig. 01G 1000 LMCInventory photo[1]

Power

0-1000 watts @ 550 VAC, selectable power[1]

Vacuum

Edwards iXH100 Vacuum Pump[1]

Gas delivery

3 optional, for gas mixing capability[1]

Optics

0-1200 seconds (20 minutes)[1]

What is it?

The Yes G 1000 LMC is a plasma cleaner with 8 standard shelves, 3 standard process gas inputs, and selectable RF plasma power up to 1000 watts.

What do the numbers mean?

Power & electrical3

RF Plasma Power
0-1000 watts @ 550 VAC, selectable power[1]
Accurate?
RF Leakage Magnetic
0.6 mA/m, 4.15 x 10-7 A2/m2 Average[1]
Accurate?
RF Leakage Electrical
1.6 V/m, 4.2 V2/m2 Average[1]
Accurate?

Vacuum & pumping1

Type of pumps
Edwards iXH100 Vacuum Pump[1]
Accurate?

Gas & chemistry5

No. of  Mass Flow Controllers
3 optional, for gas mixing capability[1]
Accurate?
No. of  Process Gas Inputs
3 standard[1]
Accurate?
Type of Gases used
Oxygen and Nitrogen[1]
Accurate?
Process Gas Flow Rate
20-50 SCCM average[1]
Accurate?
Process Gas Inputs
3 standard, 4th optional[1]
Accurate?

Optics & imaging2

Range of Exposure Time
0-1200 seconds (20 minutes)[1]
Accurate?
Resolution of Timer Setting
1 second[1]
Accurate?

Control & software2

Software[1]
Accurate?
Number of Recipes
12 with load / save / loop / link capability[1]
Accurate?

Configuration & options7

No. of trays & type
8 Standard Shelves (6 inside and 2 spare)[1]
Accurate?
Operation Temp
20 - 100*C[1]
Accurate?
N2 Flow Rate
1.7 SCFM[1]
Accurate?
Interior Chamber Dims
18 x 18 x 12"[1]
Accurate?
Chamber Material
6061-T6 aluminum[1]
Accurate?
SEMI Compliance
S2/S8[1]
Accurate?
Performance[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Type of pumpsEdwards iXH100 Vacuum Pump[1]
  • No. of  Mass Flow Controllers3 optional, for gas mixing capability[1]
  • No. of  Process Gas Inputs3 standard[1]
  • Type of Gases usedOxygen and Nitrogen[1]
  • Process Gas Flow Rate20-50 SCCM average[1]
  • Process Gas Inputs3 standard, 4th optional[1]
  • RF Plasma Power0-1000 watts @ 550 VAC, selectable power[1]
  • RF Leakage Magnetic0.6 mA/m, 4.15 x 10-7 A2/m2 Average[1]
  • RF Leakage Electrical1.6 V/m, 4.2 V2/m2 Average[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the G 1000 LMC are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the G 1000 LMC are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the G 1000 LMC are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the G 1000 LMC are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the G 1000 LMC are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the G 1000 LMC is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Yield Engineering Systems, Inc. (YES) > Applications > Polyimide Cure/Bake/Anneal > Fan Out Wafer Level Packagingyieldengineering.com (Sep 3, 2020)web.archive.org
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Last updated Jul 29, 2026.

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