SSEC
300 ML Evergreen Series III Wafer Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedThe operating principle of a wafer mask scrubber uses rotating brushes that mechanically remove particles from the mask surface while a cleaning fluid is applied.
The mask is secured on a spin chuck and rotated while brushes traverse the surface in a controlled pattern.
Where it fits in the process flow
General reference — not yet source-verifiedThe mask scrubber is typically located in a mask shop or in the photolithography area of a semiconductor fab.
Upstream processes include mask fabrication steps such as writing, developing, and etching; downstream steps include pellicle mounting and final inspection before use in a lithography exposure tool.
Applications
General reference — not yet source-verifiedThe tool is used for cleaning both binary and attenuated phase-shift photomask substrates.
Masks with pellicles can also be cleaned by this equipment, as the cleaning process is designed to avoid damage to the fragile membrane.
What do the numbers mean?
Wafer handling1
Configuration & options2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the SSEC 300 ML Evergreen Series III?
The SSEC 300 ML Evergreen Series III is a wafer mask scrubber.[1]
Who manufactures the SSEC 300 ML Evergreen Series III?
The manufacturer (make) is SSEC.[1]
What is the model designation of this equipment?
The model designation is 300 ML Evergreen Series III.[1]
Not publicly documented
The following facts about the 300 ML Evergreen Series III Wafer Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 300 ML Evergreen Series III Wafer Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 300 ML Evergreen Series III Wafer Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 300 ML Evergreen Series III Wafer Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 300 ML Evergreen Series III Wafer Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 300 ML Evergreen Series III Wafer Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Aug 14, 2026.
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