Nikon

NSR 2205 i 14 E 2 i-Line alternatives

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Comparable Lithography equipment documented in the Waferpedia catalog.

Nikon NSR 2205 i 14 E 2 i-Line entry →All Lithography tools →

6 comparable tools

ASML
PAS 5500
200mm
Lithography
The ASML PAS 5500/275D is a high-throughput i-line stepper with 5X reduction, 365 nm exposure, and automated wafer handling for substrates up to 200 mm diameter.
GCA
AS200
200mm
Lithography
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.

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