ASML
PAS 5500
Plate 01PAS 5500 – The Inside Story (1993) | ASML
ASMLWatch on YouTubePlate 02ASML PAS 5500 750 + TEL Act 8 Bundle Available, Wafer size 200mm, Location Asia
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Wafer size
200mm
Produced
2000–2010
Node / era
280 nm
Performance
Topside and backside alignment[1]
Optics
365 nm[3]
What it is
General reference — not yet source-verifiedThe ASML PAS 5500 is a family of optical photolithography steppers used to transfer mask patterns onto wafers by projection exposure. In this class of tool, the patterned reticle is reduced and imaged onto the substrate, one field at a time, to build circuit or device layers across the wafer.
How it works
A stepper exposes photoresist through a reticle with a projection lens between mask and wafer. The image is reduced before reaching the wafer, and the exposure is repeated field by field as the stage steps across the substrate. This allows the same patterned layer to be replicated over the usable wafer area with alignment control between exposures.[1]
Applications
The PAS 5500/275D is used for calibration patterns, gratings and waveguides, microelectromechanical systems, and thermal sensors. Its supported substrates include wafers from 75 mm to 200 mm diameter, with small pieces also processable on carrier wafers.[3]
- Measurement calibration patterns
- Gratings and waveguides
- Microelectromechanical systems
- Thermal sensors
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Backside contamination can locally deform the wafer surface and degrade focus/printing quality.
- Wafer stage contamination can result in machine downtime of several days.
- Reticle contamination can cause printing defects and irreversible degradation of printing performance.
What do the numbers mean?
Wafer handling7
Optics & imaging5
Performance1
Configuration & options2
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| PAS 5500/275D | i-line | — | High-throughput i-line stepper using 365 nm light; 5X reduction and projection capability; automated wafer handling for substrates from 200 mm diameter wafers down to small pieces. | nist.gov[3] |
| PAS 5500/60 | i-line | — | Automatic 100 mm wafer cassette processing capability; 365 nm near-UV light; minimum feature size of 450 nm; 150 mm capable with advanced notice. | snfguide.stanford.edu[4] |
| PAS 5500/350C | — | 2000–2010 | DUV photolithography stepper using 248 nm KrF laser source; 4x or 5x reduction; high throughput; handles 100 mm wafers by default and 150 mm on request. | epfl.ch[1] |
| PAS 5500/300 | DUV | — | Described as a DUV stepper configured for 4-inch wafers. | wiki.nanotech.ucsb.edu[5] |
| PAS 5500/200 | i-line | — | Described as a 5X reduction, i-line stepper for 6 inch wafers using 6 inch reticles, with 350 nm resolution, 0.48-0.60 variable numerical aperture, 22x22 mm maximum field size, and better than 50 nm overlay capability. | manualslib.com[6] |
| PAS 5500/400 | Step & Scan | 1995 | Described as the second step & scan system released by ASML, with a 4X reduction ratio and maximum long-term mask overlay of 35 nm. | chiphistory.org[2] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Nikon NSR 2205 i 14 E 2 i-Line— Same function class: Lithography, 200mmCompare in depthsource[3]
- GCA AS200— Same function class: Lithography, 200mmCompare in depthsource[3]
Related models
- predecessorASML PAS 2000— ASML developed the PAS 5500 after the PAS 2000; the PAS 5500 became the company's first commercial breakout.source[7]
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- DUV Resist InformationDocumentcornell.edu
- SPR 220-3.0Datasheetucsb.edu
- SPR220 (SPR220-3, SPR220-7)Datasheetucsb.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What exposure wavelength does the PAS 5500/275D use?
It uses 365 nm wavelength light.[3]
What resolution is given for the PAS 5500/275D?
It is capable of 280 nm resolution.[3]
What substrate sizes are supported on the PAS 5500/275D?
The tool supports 75 mm, 100 mm, 150 mm, and 200 mm wafers, and small pieces can be processed on carrier wafers.[3]
What light source does the PAS 5500/350C use?
It uses DUV light from a KrF laser source at 248 nm.[1]
Not publicly documented
The following facts about the PAS 5500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the PAS 5500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented compatible parts, consumables, or accessories for the PAS 5500 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (11)Every fact above is drawn from these public sources
- [1]epfl.ch — epfl.chepfl.ch
- [2]chiphistory.org — chiphistory.orgchiphistory.org
- [3]nist.gov — nist.govnist.gov
- [4]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
- [5]wiki.nanotech.ucsb.edu — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [6]manualslib.com — manualslib.commanualslib.com
- [7]en.wikipedia.orgen.wikipedia.org
- [8]Equipment Resources | CNF — cnf.cornell.educnf.cornell.edu
- [9]Lithography — tudelft.nltudelft.nl
- [10]ASML PAS 5500/200 – Stepper | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
- [11]ASML: Products - TWINSCAN NXT:1970Ci — asml.com (Sep 15, 2016)web.archive.org
Last updated Jul 29, 2026.
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