OAI
808-Aligner-Tool-Procedu alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
ASML
5500
100mm
Lithography
ASML PAS 5500/300 is a deep-UV stepper photolithography tool configured for 4-inch wafers.
GCA
6100 C Wafer
100mm
Lithography
The GCA 6100 C Wafer Stepper is a lithography tool for 100 mm wafers with a 150 mm X/Y stage travel and an AWH1 automatic wafer handler.
OAI
808
100mm
Lithography
The OAI 808 Aligner is a semi-automated, four-camera, optical front- and backside mask aligner with stated alignment accuracy of 1µm to 2µm.
SUSS MicroTec
ACS200
100mm
Lithography
The SUSS ACS200 GEN3 is a modular cluster tool for coating and development of i-line photoresists.
Tokyo Electron
CleanTrack ACT 8
100mm
Lithography
Tokyo Electron Clean Track ACT-8 is an industry-standard wafer coater and developer used in a DUV lithography cluster with an in-line exposure unit interface.
EV Group
EVG 150
100mm
Lithography
The EVG 150 is a modular cluster tool for coating and development of i-line photoresists.
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