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SUSS MicroTec

ACS200

Lithography100mmi-lineSUSS MicroTec ACS200 family
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ACS200 — Inventory photo
Fig. 01ACS200Inventory photo[1]
  • Plate 01ACS200 Gen3 TE Coater & Developer - Fully Automated Platform for Maximum Throughput

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What it is

The Süss ACS 200 Gen3 is a modular cluster tool for coating and development of i-line photoresists.[3]

It is configured with two loading and unloading ports, a wafer centering station, two spin-coating modules, one development module with puddle and spray options, two stacks of hotplates and coolplates, and an additional HMDS-priming module.[3]

How it works

The individual processing modules are fed by a central robot.[3]

Sequences consist of specific flows of sub-recipes running in individual modules. Several sequences, started from a single or both cassettes, can be active in parallel, and the flow is managed in real time by the software and optimized for maximum throughput or for prioritization of critical steps.[3]

Where it fits in the process flow

The tool can handle standard SEMI-wafers of 100 mm and 150 mm diameter on request, including opaque wafers such as silicon and SOI, and transparent wafers such as glass, fused silica, and sapphire.[3]

The process-flow library includes sections for PR coating on 4-inch wafers, PR development on 4-inch wafers, PR coating and development on 6-inch wafers with configuration request, high-topography recipes, preventive maintenance and development, and user custom sequences.[3]

Applications

The ACS 200 is used for coating and development of i-line photoresists.[3]

Photoresists currently available on the ACS 200 are AZ ECI 3007, AZ ECI 3027, AZ 10XT-20, AZ 10XT-60, AZ 15nXT, and AZ 40XT.[3]

  • Coating
  • Development
  • Photolithography

What do the numbers mean?

Wafer handling4

Loading/unloading ports
Two loading/unloading ports: one cassette for coating and one cassette for development[3]
Accurate?
Wafer centering
Wafer centering station[3]
Accurate?
Wafer handling
Standard SEMI-wafers of 100 mm and 150 mm diameter[3]
Accurate?
Supported wafer materials
Opaque wafers (silicon, SOI) and transparent wafers (glass, fused-silica, sapphire)[3]
Accurate?

Configuration & options7

Tool type
Modular cluster tool[3]
Accurate?
Process
Coating and development of i-line photoresists[3]
Accurate?
Spin-coating modules
Two spin-coating modules[3]
Accurate?
Development module
One development module with puddle and spray options[3]
Accurate?
Hotplates and coolplates
Two stacks of hotplates (9 in total) and coolplates (3 in total)[3]
Accurate?
HMDS priming
Additional HMDS-priming module[3]
Accurate?
Photoresists available
AZ ECI 3007, AZ ECI 3027, AZ 10XT-20, AZ 10XT-60, AZ 15nXT, AZ 40XT[3]
Accurate?
Interested in this tool?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the ACS200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ACS200 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the ACS200 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the ACS200 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the ACS200 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the ACS200 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]epfl.chepfl.chepfl.ch
  4. [4]XB8 Permanent Bonder | SUSSsuss.com (Nov 13, 2024)web.archive.org
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Last updated Jul 29, 2026.

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