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Plasma-Therm

Unaxis 790

EtchPlasma-Therm Unaxis 790 family
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Plasma-ThermUnaxis 790
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Power

3 Phase[1]

Gas delivery

Ar, O2, CF4, CHF3, SF6[2]

What it is

General reference — not yet source-verified

Reactive ion etchers are dry etch systems used to transfer patterned openings into exposed films on a substrate. Reactive ion etchers sit after lithography in the pattern transfer sequence and before later stripping, cleaning, deposition, or additional etch steps.

Where it fits in the process flow

The Unaxis 790 has a large chamber that can accommodate substrates ranging from 200 mm diameter wafers down to small pieces. The Unaxis 790 supports a maximum wafer diameter of 200 mm, and small pieces are supported.[2][3]

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • The automatic vent feature does not work properly and should not be used.

What do the numbers mean?

Power & electrical5

Phase
3 Phase[1]
Accurate?
Voltage
208 Vac[1]
Accurate?
50/60 Hz[1]
Accurate?
RF power source
Up to 500 W at 13.56 MHz[2]
Accurate?
Electrical configuration
3 phase, 5 wire, 208 Vac, 50/60 Hz[1]
Accurate?

Wafer handling1

Maximum wafer diameter
200 mm (8 in)[2]
Accurate?

Gas & chemistry1

Process gases
Ar, O2, CF4, CHF3, SF6[2]
Accurate?

Configuration & options5

5 Wire[1]
Accurate?
Tool type
Reactive ion etcher (RIE)[2]
Accurate?
Process
General purpose parallel plate plasma etching system[2]
Accurate?
Electrode temperature range
0 °C to 70 °C[2]
Accurate?
Small pieces supported
Yes[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Unaxis 790 Middle——NIST identifies this as a specific NanoFab tool location/variant designation.nist.gov[2]
Unaxis 790 Right——NIST identifies this as a specific NanoFab tool location/variant designation.nist.gov[3]
Plasma-Therm Unaxis 790 Dual Chamber Shuttle Load Lock System—2001Described as a dual chamber shuttle load lock system with PC controller, no endpoint detection, AE RF 5S generator, eight gas inputs, and loadlock.capovani.com[4]
Plasma-Therm Unaxis 790 DRIE PECVD——Described with DRIE and PECVD process capability and PC controller.semistarcorp.com[5]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Phase3 Phase[1]
  • Voltage208 Vac[1]
  • Configuration50/60 Hz[1]
  • RF power sourceUp to 500 W at 13.56 MHz[2]
  • Process gasesAr, O2, CF4, CHF3, SF6[2]
  • Electrical configuration3 phase, 5 wire, 208 Vac, 50/60 Hz[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What substrate size can the Unaxis 790 accept?

The Unaxis 790 can accommodate substrates ranging from 200 mm diameter wafers down to small pieces. The maximum wafer diameter is 200 mm, and small pieces are supported.[2][3]

Not publicly documented

The following facts about the Unaxis 790 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Unaxis 790 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Unaxis 790 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the Unaxis 790 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Unaxis 790 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the Unaxis 790 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]nist.gov — nist.govnist.gov
  3. [3]nist.gov — nist.govnist.gov
  4. [4]capovani.com — capovani.comcapovani.com
  5. [5]semistarcorp.com — semistarcorp.comsemistarcorp.com
  6. [6]Plasmatherm Unaxis 790 | SemiStar — semistarcorp.comsemistarcorp.com
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Last updated Oct 21, 2026.

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