Plasma-Therm
The tool is used for anisotropic thin-film etching, photoresist descum, and silicon nitride membrane fabrication. It is also used for reactive ion etching of silicon, silicon oxide, and silicon nitride.[2][3]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Unaxis 790 Middle | — | — | NIST identifies this as a specific NanoFab tool location/variant designation. | nist.gov[2] |
| Unaxis 790 Right | — | — | NIST identifies this as a specific NanoFab tool location/variant designation. | nist.gov[3] |
| Plasma-Therm Unaxis 790 Dual Chamber Shuttle Load Lock System | — | 2001 | Described as a dual chamber shuttle load lock system with PC controller, no endpoint detection, AE RF 5S generator, eight gas inputs, and loadlock. | capovani.com[4] |
| Plasma-Therm Unaxis 790 DRIE PECVD | — | — | Described with DRIE and PECVD process capability and PC controller. | semistarcorp.com[5] |
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The following facts about the Unaxis 790 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Unaxis 790 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Unaxis 790 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Unaxis 790 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Unaxis 790 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Unaxis 790 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Jul 30, 2026.