Tool family
The SUSS MA 6 / BA 6 Gen 2 Mask Aligner is a lithography mask aligner with topside and backside alignment, a 150 mm chuck, and UV400 splitfield optics for 365 nm and 405 nm exposure.
The SUSS MA 6 / BA 6 Mask Aligner is a lithography mask aligner line with source-stated variants for top-side alignment, back-side alignment, and optical BSA configurations.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MA 6 / BA 6 TSA (Top-Side Alignment), BSA (Back-Side Alignment) | — | 2001 | Listed with TSA and BSA. | Equipment inventory listing[1] |
| MA 6 / BA 6 Optical BSA | — | 2000 | Listed with optical BSA, DVM6 microscope, upgraded Gen2 CIC power supply, 350W lamphouse, 50/60 Hz, 230 V, and 1500 VA. | Equipment inventory listing[2] |
| MA 6 / BA 6 | — | — | — | Equipment inventory listing[3] |
SUSS MicroTec MA 6 Mask is a lithography mask aligner used for contact or proximity pattern transfer onto substrates. It belongs to the class of alignment and exposure tools used in patterning workflows for microfabrication.
The SUSS MA 6 / BA 6 Gen 2 Mask Aligner is a lithography mask aligner with topside and backside alignment, a 150 mm chuck, and UV400 splitfield optics for 365 nm and 405 nm exposure.
The SUSS MA 6 / BA 6 Mask Aligner is a lithography mask aligner line with source-stated variants for top-side alignment, back-side alignment, and optical BSA configurations.
General referenceSUSS MicroTec MA 6 Mask is a lithography mask aligner used for contact or proximity pattern transfer onto substrates. It belongs to the class of alignment and exposure tools used in patterning workflows for microfabrication.