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SUSS MicroTec

MA 6 BA 6 Gen 2 Mask

LithographySUSS MicroTec MA 6 Mask family
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The SUSS MA 6 / BA 6 Gen 2 Mask Aligner is a lithography mask aligner. The SUSS MA 6 / BA 6 Gen 2 Mask Aligner includes topside alignment and backside alignment. The SUSS MA 6 / BA 6 Gen 2 Mask Aligner uses UV400 splitfield optics for 365nm and 405nm exposure.[1]

MA 6 BA 6 Gen 2 Mask — Inventory photo
Fig. 01MA 6 BA 6 Gen 2 MaskInventory photo[1]

Power

230V, 50/60 Hz[1]

Performance

Topside (TSA) Alignment[1]

Optics

7x7 Maskholder included[1]

What it is

General reference — not yet source-verified

Mask aligners are photolithography tools that align a photomask to a substrate and expose photosensitive resist with ultraviolet light. Mask aligners are used to transfer patterned layers during microfabrication on wafers and other flat substrates.

How it works

The SUSS MicroTec MA 6 BA 6 Gen 2 is capable of hard contact, soft contact, and vacuum contact with proper tooling. The SUSS MicroTec MA 6 BA 6 Gen 2 uses UV400 splitfield optics for exposure at three hundred sixty five nanometer and four hundred five nanometer wavelengths.[1]

Where it fits in the process flow

General reference — not yet source-verified

Mask aligners sit in the lithography portion of a microfabrication flow after substrate preparation and photoresist coating. Mask aligners are used before resist development and before the downstream etch, deposition patterning, implantation, or lift off steps that rely on the transferred resist image.

Applications

General reference — not yet source-verified

Mask aligners are used for patterned resist exposure in semiconductor, microsystem, and related cleanroom fabrication. Mask aligners are suited to processes that use contact or proximity exposure for layer definition, including front side patterning and flows that need alignment to structures already formed on either side of the substrate.

What do the numbers mean?

Power & electrical3

UV400 splitfield Optics (for 365nm and 405nm exposure) CIC 500 Power Supply Capable of Hard, Soft, Vacuum Contact with proper tooling.[1]
Accurate?
System Power
230V, 50/60 Hz[1]
Accurate?
Power supply
CIC 500 power supply[1]
Accurate?

Vacuum & pumping1

Contact modes
Hard, soft, and vacuum contact with proper tooling[1]
Accurate?

Wafer handling2

Vibration Isolation Table (for Suss MA6) 150mm Chuck included[1]
Accurate?
Wafer chuck
150mm chuck included[1]
Accurate?

Optics & imaging3

7x7 Maskholder included[1]
Accurate?
Optics
UV400 splitfield optics for 365nm and 405nm exposure[1]
Accurate?
Maskholder
7x7 maskholder included[1]
Accurate?

Performance3

Topside (TSA) Alignment[1]
Accurate?
Backside (BSA) Alignment[1]
Accurate?
Alignment modes
Topside (TSA) alignment; backside (BSA) alignment[1]
Accurate?

Configuration & options3

Suss DVM6 Microscope[1]
Accurate?
Power
1500W Lamphouse[1]
Accurate?
Lamphouse
1500W lamphouse[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationUV400 splitfield Optics (for 365nm and 405nm exposure) CIC 500 Power Supply Capable of Hard, Soft, Vacuum Contact with proper tooling.[1]
  • System Power230V, 50/60 Hz[1]
  • Power supplyCIC 500 power supply[1]
  • Contact modesHard, soft, and vacuum contact with proper tooling[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

Does the SUSS MicroTec MA 6 BA 6 Gen 2 support backside alignment?

The SUSS MicroTec MA 6 BA 6 Gen 2 supports backside alignment and topside alignment.[1]

What microscope and optics are installed on the SUSS MicroTec MA 6 BA 6 Gen 2?

The SUSS MicroTec MA 6 BA 6 Gen 2 is equipped with a Suss DVM6 microscope and UV400 splitfield optics.[1]

What contact modes does the SUSS MicroTec MA 6 BA 6 Gen 2 support?

The SUSS MicroTec MA 6 BA 6 Gen 2 is capable of hard contact, soft contact, and vacuum contact with proper tooling.[1]

Not publicly documented

The following facts about the MA 6 BA 6 Gen 2 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 6 BA 6 Gen 2 Mask are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the MA 6 BA 6 Gen 2 Mask are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the MA 6 BA 6 Gen 2 Mask are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the MA 6 BA 6 Gen 2 Mask are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the MA 6 BA 6 Gen 2 Mask is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
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Last updated Oct 17, 2026.

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