SUSS MicroTec

MA 6 BA 6 Gen 2 Mask

Lithography SUSS MicroTec MA 6 Mask family

Research Quality: 30% complete

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MA 6 BA 6 Gen 2 Mask — Inventory photo — Fig. 01MA 6 BA 6 Gen 2 MaskInventory photo^[1]

Power

230V, 50/60 Hz^[1]

Performance

Topside (TSA) Alignment^[1]

Optics

7x7 Maskholder included^[1]

What is it?

The SUSS MA 6 / BA 6 Gen 2 Mask Aligner is a lithography mask aligner with topside and backside alignment, a 150 mm chuck, and UV400 splitfield optics for 365 nm and 405 nm exposure.

What do the numbers mean?

Power & electrical2

UV400 splitfield Optics (for 365nm and 405nm exposure) CIC 500 Power Supply Capable of Hard, Soft, Vacuum Contact with proper tooling.^[1]
System Power: 230V, 50/60 Hz^[1]

Wafer handling1

Vibration Isolation Table (for Suss MA6) 150mm Chuck included^[1]

Accurate?

Optics & imaging1

7x7 Maskholder included^[1]

Accurate?

Performance2

Topside (TSA) Alignment^[1]

Accurate?

Backside (BSA) Alignment^[1]

Accurate?

Configuration & options2

Suss DVM6 Microscope^[1]
Power: 1500W Lamphouse^[1]

Interested in this tool?

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

ConfigurationUV400 splitfield Optics (for 365nm and 405nm exposure) CIC 500 Power Supply Capable of Hard, Soft, Vacuum Contact with proper tooling.^[1]
System Power230V, 50/60 Hz^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What exposure wavelengths are supported by the listed optics?

The listed splitfield optics are for 365 nm and 405 nm exposure.^[1]

What chuck size is included?

A 150 mm chuck is included.^[1]

What maskholder is included?

A 7 x 7 maskholder is included.^[1]

Not publicly documented

The following facts about the MA 6 BA 6 Gen 2 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 6 BA 6 Gen 2 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 6 BA 6 Gen 2 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 6 BA 6 Gen 2 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 6 BA 6 Gen 2 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 6 BA 6 Gen 2 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report