SUSS MicroTec
MA 6 BA 6 Mask
What it is
General reference — not yet source-verifiedThe SUSS MicroTec MA 6 / BA 6 Mask Aligner is a photolithography aligner used for contact exposure of patterned masks onto substrates. In this equipment class, the tool aligns a photomask to a wafer or die and transfers the mask pattern by ultraviolet exposure.
How it works
General reference — not yet source-verifiedA mask aligner works by holding a wafer or die on a chuck, positioning a mask above or against the substrate, and using optical alignment features to register the mask pattern to existing features on the surface. Exposure then transfers the pattern in contact or near-contact mode, with the exact contact mode depending on the tooling and process setup.
Where it fits in the process flow
What do the numbers mean?
Power & electrical6
Vacuum & pumping1
- Capable of Soft, Hard, and Vacuum contact modes (tooling-dependent)[3]
Wafer handling1
Optics & imaging4
Performance1
- TSA (Top-Side Alignment), BSA (Back-Side Alignment)[2]
Control & software1
- HDD and software included[3]
Configuration & options10
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MA 6 / BA 6 TSA (Top-Side Alignment), BSA (Back-Side Alignment) | — | 2001 | Listed with TSA and BSA. | Equipment inventory listing[2] |
| MA 6 / BA 6 Optical BSA | — | 2000 | Listed with optical BSA, DVM6 microscope, upgraded Gen2 CIC power supply, 350W lamphouse, 50/60 Hz, 230 V, and 1500 VA. | Equipment inventory listing[7] |
| MA 6 / BA 6 | — | — | — | Equipment inventory listing[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does a mask-aligner do in lithography?General reference — not yet source-verified
It aligns a patterned mask to a resist-coated substrate and uses light to transfer the mask image into the resist.
How is this class different from projection lithography?General reference — not yet source-verified
A mask-aligner exposes the substrate through a mask placed close to the surface, rather than using a complex lens projection system.
What materials are typically processed on a machine of this class?General reference — not yet source-verified
These systems are generally used with flat substrates coated in photoresist, including semiconductor wafers and similar microfabrication substrates.
Where does this equipment fit in the fabrication flow?General reference — not yet source-verified
It is used during the patterning stage, after resist preparation and before development and subsequent material processing.
Not publicly documented
The following facts about the MA 6 BA 6 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 6 BA 6 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MA 6 BA 6 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 6 BA 6 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 6 BA 6 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 6 BA 6 Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (9)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]Inventory photo
- [7]inventory listing
- [8]MNTC - Equipment and Facilities | Service Centers — louisville.edulouisville.edu
- [9]Mask/bond aligner:front/back capable [SUSS-align] | Quantum-Nano Fabrication and Characterization Facility | University — uwaterloo.cauwaterloo.ca
Last updated Jul 30, 2026.
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