Manufacturer
AJA
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16 entries
- ATC 2200AJA
The AJA ATC 2200 is a UHV sputtering system used for physical vapor deposition of films on substrates.
CategoryDepositionWafer6" - ATC OrionAJA
The AJA ATC Orion 8 UHV Sputtering System is a physical vapor deposition tool that deposits films on a substrate using magnetron sputtering.
CategoryDepositionWafer6 in - 9856 IRCAJA
The AJA 9856 IRC is a sputtering system from AJA, categorized as deposition equipment.
CategoryDeposition - ATC 2036 EAJA
The AJA ATC 2036 E is an evaporator with a 15-20 inch adjustable source-to-wafer length.
CategoryDepositionWafer15-20” adjustable length from source to wafer - A300-XPAJA
The A300-XP is an AJA UHV magnetron sputtering source series described as an expanded-performance version of the A300 series.
CategoryDeposition - BSG-200AJA
The AJA BSG-200 Series Substrate Holder is a backside-gas-cooled rotating substrate holder for wafers or similar planar substrates up to 200 mm in diameter.
CategorySubstrate holderWafer200mm - TR5313AJA
The AJA TR5313 is a triangular magnetron sputtering source designed to optimize deposition uniformity onto a circle of substrates up to 8 inches in diameter.
CategoryDepositionWaferup to 8-inch diameter substrates - A300AJA
AJA A300 is an A300 Series modular magnetron sputtering source used in Orion-series sputtering systems.
CategoryDepositionWaferup to 6 in diameter - ATC 1500 FAJA
The AJA ATC 1500 F is a sputter coater with substrate size up to 3 inches.
CategoryDeposition - CT1210AJA
The AJA CT1210 is a cylindrical target magnetron used for 3D sputtering where substrates are immersed into the target/cathode.
CategoryDeposition - NT-80AJA
The AJA NT-80 is a Nautilus Series rotating magnetron with a configurable magnet array for optimizing target utilization, uniformity, or intentional non-uniformity.
CategoryDeposition - 300AJA
The AJA 300 is a 300 amp water cooled thermal evaporation source used in AJA thermal evaporation systems.
CategoryDeposition - A3CVAJA
The AJA A3CV is a magnetron sputtering source line with a common source head subassembly that accepts multiple target modules and is offered in HV and UHV mounting versions.
CategoryDeposition - SBE-6AJA
The AJA SBE-6 is a Sputter Beam Epitaxy deposition system that combines sputtering with deposition quality described as rivaling molecular beam epitaxy.
CategoryDeposition - BSG-200SeriesAJA
The AJA BSG-200 Series is a substrate holder for wafers or similar planar substrates up to 200 mm in diameter with direct backside gas cooling while rotating.
CategorySubstrate holderWafer200mm - Q2AJA
The AJA Q2 is a loadlocked UHV sputter deposition system with RF and DC sputtering capability, RF substrate pre-treatment, and an in-chamber ion source for substrate cleaning.
CategoryDeposition
