AJA

The AJA BSG-200 Series Substrate Holder is a backside-gas-cooled rotating substrate holder for wafers or similar planar substrates up to 200 mm in diameter.

The AJA ATC Orion 8 UHV Sputtering System is a physical vapor deposition tool that deposits films on a substrate using magnetron sputtering.

The AJA BSG-200 Series is a substrate holder for wafers or similar planar substrates up to 200 mm in diameter with direct backside gas cooling while rotating.

The AJA Q2 is a loadlocked UHV sputter deposition system with RF and DC sputtering capability, RF substrate pre-treatment, and an in-chamber ion source for substrate cleaning.

The AJA ATC 2200 is a UHV sputtering system used for physical vapor deposition of films on substrates.

The AJA TR5313 is a triangular magnetron sputtering source designed to optimize deposition uniformity onto a circle of substrates up to 8 inches in diameter.

AJA A300 is an A300 Series modular magnetron sputtering source used in Orion-series sputtering systems.

The AJA ATC 2036 E is an evaporator with a 15-20 inch adjustable source-to-wafer length.

The AJA ATC 1500 F is a sputter coater with substrate size up to 3 inches.

The AJA CT1210 is a cylindrical target magnetron used for 3D sputtering where substrates are immersed into the target/cathode.

The AJA SBE-6 is a Sputter Beam Epitaxy deposition system that combines sputtering with deposition quality described as rivaling molecular beam epitaxy.

The AJA NT-80 is a Nautilus Series rotating magnetron with a configurable magnet array for optimizing target utilization, uniformity, or intentional non-uniformity.

The AJA A3CV is a magnetron sputtering source line with a common source head subassembly that accepts multiple target modules and is offered in HV and UHV mounting versions.

The A300-XP is an AJA UHV magnetron sputtering source series described as an expanded-performance version of the A300 series.