Applied Materials
5500 100 D
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedDuring operation, a stepper aligns a photomask above a substrate. The substrate is coated with a photosensitive resist. A light source illuminates the mask, exposing the resist in the open areas. The substrate is then moved, and the process repeats until the entire substrate is exposed.
A scanner uses a precisely controlled beam of light to write the pattern directly onto the resist. The beam is focused to a small spot and moved across the substrate in a raster pattern, creating the desired features.
Where it fits in the process flow
General reference — not yet source-verifiedIn a semiconductor fabrication line, lithography equipment is used after the substrate has been cleaned and coated with a photosensitive resist. After exposure, the substrate moves to a developing step where the imprinted pattern becomes visible, followed by etching or deposition to transfer the pattern into the substrate layers.
What do the numbers mean?
Configuration & options3
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the function of the Applied Materials 5500 100 D?
The Applied Materials 5500 100 D is a stepper and scanner used in lithography.[1][2]
Who manufactured the Applied Materials 5500 100 D?
The Applied Materials 5500 100 D was manufactured by Applied Materials.[1][2]
What category of equipment is the 5500 100 D?
The 5500 100 D is categorized as lithography equipment.[2]
Not publicly documented
The following facts about the 5500 100 D are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 5500 100 D are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 5500 100 D are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 5500 100 D are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 5500 100 D are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 5500 100 D is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 1, 2026.
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