Waferpedia

Applied Materials

Centura 5200 RTP Reactor

The Applied Materials Centura 5200 is a rapid thermal process (RTP) reactor. The Applied Materials Centura 5200 uses a standard system controller and operates on 208 VAC, 3-phase power. The Applied Materials Centura 5200 is Y2k compliant and features a UHP gas panel.[1]

Centura 5200 RTP Reactor — Inventory photo
Fig. 01Centura 5200 RTP ReactorInventory photo[1]

Power

208 VAC, 3 Phase[1]

Vacuum

Ebara[1]

Gas delivery

UHP[1]

What it is

The Applied Materials Centura 5200 is a rapid thermal processing (RTP) reactor designed for single-wafer thermal treatment in semiconductor manufacturing. The system is configured as a single-chamber unit and operates on 208 VAC three-phase power. The Centura 5200 uses an Ebara A30 loadlock pump and is equipped with a UHP-grade (ultra-high purity) gas panel. The system is Y2K compliant and uses a standard system controller.[1]

How it works

General reference — not yet source-verified

Rapid thermal processing reactors heat a single wafer to high temperatures using arrays of tungsten-halogen lamps or other radiant heat sources. The wafer is rapidly brought to the target temperature, held for a short duration (typically seconds), and then cooled quickly. Temperature uniformity is maintained through real-time pyrometry and closed-loop lamp power control inside a cold-wall quartz chamber.

Where it fits in the process flow

General reference — not yet source-verified

The Centura 5200 RTP reactor is used in front-end-of-line (FEOL) and back-end-of-line (BEOL) process flows. In FEOL, it is typically placed after ion implantation to activate dopants and repair crystalline damage. In BEOL, it can be used for silicide formation (e.g., nickel or cobalt silicide) and for annealing of high-k dielectrics or metal gates.

What do the numbers mean?

Power & electrical2

Voltage
208 VAC, 3 Phase[1]
Accurate?
Power
208 VAC, 3 Phase[1]
Accurate?

Vacuum & pumping2

Loadlock Pump
Ebara[1]
Accurate?
Pump Size
A30[1]
Accurate?

Gas & chemistry2

Gas Panel Purity
UHP[1]
Accurate?
Gas Panel Type
Standard[1]
Accurate?

Control & software1

System Controller
Standard[1]
Accurate?

Configuration & options6

Fab installation
TTW[1]
Accurate?
System Umbilicals
25 ft[1]
Accurate?
I/O Slit Valve Type
Viton[1]
Accurate?
Chambers
1[1]
Accurate?
Y2k compliant
Yes[1]
Accurate?
OTF Certified
Yes[1]
Accurate?

Observed configurations

How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.

Unit as listed[1]

  • 1 Ch
  • 208 VAC, 3 Phase
  • System Controller: Standard
  • Fab installation: TTW
  • System Umbilicals: 25 ft
  • Y 2k Compliant
  • Loadlock Pump: Ebara
  • Pump Size: A30
  • I/O Slit Valve Type: Viton
  • Gas Panel Purity: UHP
  • Gas Panel Type: Standard
  • OTF Certified
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Voltage208 VAC, 3 Phase[1]
  • Loadlock PumpEbara[1]
  • Pump SizeA30[1]
  • Gas Panel PurityUHP[1]
  • Gas Panel TypeStandard[1]
  • Power208 VAC, 3 Phase[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Centura 5200 RTP Reactor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 RTP Reactor are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Centura 5200 RTP Reactor are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Centura 5200 RTP Reactor are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Centura 5200 RTP Reactor are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Centura 5200 RTP Reactor is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
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Last updated Sep 24, 2026.

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