Applied Materials
Centura I P 1
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials Centura I P 1 is an oxide etcher for 6-inch wafers. The Centura I P 1 features two chambers and MxP+ configuration.[1]
What it is
General reference — not yet source-verifiedThe Centura series is a multi-chamber cluster platform used in semiconductor fabrication. The system employs a vacuum load lock and a central robot to transfer wafers between chambers under vacuum.
How it works
General reference — not yet source-verifiedPlasma etching in the Centura I P 1 removes material through chemical and physical interactions between a radio-frequency generated plasma and the wafer surface.
The cluster architecture allows sequential processing in dedicated chambers without breaking vacuum, improving throughput and process control.
Where it fits in the process flow
General reference — not yet source-verifiedOxide etching is typically performed after lithographic patterning to open contact holes or via structures in the interlayer dielectric.
The etch step is followed by photoresist stripping and wet cleaning to remove residues before subsequent deposition or metallization.
Applications
The Centura I P 1 etcher is configured for oxide etching.[1]
What do the numbers mean?
Wafer handling1
Configuration & options5
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Centura I P 1 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura I P 1 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura I P 1 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura I P 1 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura I P 1 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura I P 1 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]inventory listing
Last updated Aug 14, 2026.