Applied Materials
Centura I P 2 DPS
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Applied Materials Centura I P 2 DPS is a semiconductor deposition tool. The model name includes Decoupled Plasma Source, which places it in a plasma-assisted deposition class.[1]
How it works
General reference — not yet source-verifiedA plasma-assisted deposition tool uses plasma energy to support film formation on a wafer surface. The decoupled-plasma architecture separates plasma generation from wafer-side process conditions so the process can control film growth and plasma action with more independence than a directly coupled arrangement.
A deposition chamber presents process gases to the wafer surface while the plasma activates those gases. The wafer receives a thin film on its surface as the process repeats under controlled chamber conditions.
Where it fits in the process flow
General reference — not yet source-verifiedThe Centura I P 2 DPS belongs in the deposition segment of semiconductor fabrication. Deposition follows earlier wafer preparation and pattern-definition steps and precedes later etch or planarization steps in many process flows.
What do the numbers mean?
Wafer handling1
Configuration & options6
- R1 Metal 2CH ASP+ 2CH[1]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Centura I P 2 DPS, 8" R1 Metal 2CH ASP+ 2CH 2002 Vintage | — | 2002 | The source states this example is a 2002 vintage unit and includes the descriptors 8" R1 Metal 2CH ASP+ 2CH. | Equipment inventory listing[1] |
| Centura I P 2 DPS, 8" R1 Metal 2CH ASP+ 2CH 2000 Vintage | — | 2000 | The source states this example is a 2000 vintage unit and includes the descriptors 8" R1 Metal 2CH ASP+ 2CH. | Equipment inventory listing[3] |
| Centura I P 2 DPS, 8" R1 Metal 2CH ASP+ 2CH | — | 2000 | — | waferpedia.com[2] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Centura I P 2 DPS are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura I P 2 DPS are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Centura I P 2 DPS are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura I P 2 DPS are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura I P 2 DPS is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Centura I P 2 DPS are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
Last updated Oct 21, 2026.
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