Applied Materials
EHP 500
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials / Varian EHP 500 is a medium current ion implanter that processes 6-inch wafers.[1]
What it is
How it works
General reference — not yet source-verifiedAn ion implanter accelerates dopant ions and embeds them into a wafer surface to change the electrical properties of selected regions.
A medium current implanter serves implantation steps that require controlled dose delivery and patterned doping with good repeatability.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a front-end semiconductor process step used after patterning masks define exposed regions on the wafer.
The process typically follows formation of a masking layer and precedes thermal steps that activate implanted dopants and repair lattice damage.
Applications
What do the numbers mean?
Wafer handling1
Configuration & options5
- Medium Current[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian Viision 200 Ion— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian EHPI E 220— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian EHPI 500— Same function class: Ion Implantation, nullCompare in depthsource[1]
- Varian Viision 200— Same function class: Ion Implantation, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the EHP 500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EHP 500 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EHP 500 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EHP 500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EHP 500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EHP 500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Applied Materials EHP 500 family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 12, 2026.
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The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
The Varian EHPI E 220 is an ion implanter described as an 8-inch, medium-current system with a SMIF interface.
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
The Varian Viision 200 is an ion implanter for 8-inch wafers.