Applied Materials
Mirra 3400
The Applied Materials Mirra 3400 is a chemical mechanical planarization (CMP) system for 150 mm and 200 mm wafer processing. The Mirra 3400 supports multiple technologies including oxide, STI, tungsten, and copper CMP, as well as polyimide and amorphous silicon materials.[1]
What it is
How it works
General reference — not yet source-verifiedA CMP tool removes material by combining mechanical pad action with chemical slurry action on the wafer surface.
Where it fits in the process flow
General reference — not yet source-verifiedThe Mirra 3400 belongs in the wafer planarization portion of the fab flow, after front end patterning steps that leave films or topography requiring surface conditioning.
Applications
The Mirra 3400 is used for oxide and STI planarization.[5]
What do the numbers mean?
Power & electrical1
Vacuum & pumping3
Wafer handling2
Gas & chemistry5
Control & software7
Configuration & options15
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Mirra 3400 Stand-Alone | — | 1996 | Stand-alone configuration for Oxide/STI CMP, includes wet-in-wet-out handling and specific options such as TITAN1 UPA, DDF3 pad conditioner, and Windows NT control. | fabsurplus.com[5] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- GigaMat 3806 L— Same function class: CMP, UnknownCompare in depthsource[6]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Slurry DeliveryRotary pump (6)[3]
- Slurry ConfigurationAB, AB w/ Position Sensor[3]
- Slurry Delivery Arm TypeExtended w/ 4 Outputs[3]
- UPA SupplyNitrogen Gas[3]
- Min / Max Slurry Flow15 - 400 ml/mn[3]
- Min / Max Head pressure0.7 - 14 psi[3]
- Slurry flow rate range15 – 400 ml/min[3]
- Head pressure range0.7 – 14 psi[3]
- Electrical requirements200/208 VAC, 200 A, 45 kVA[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Mirra 3400 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the Mirra 3400 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mirra 3400 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mirra 3400 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Mirra 3400 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Mirra 3400 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]smtnet.com — smtnet.comsmtnet.com
- [2]Equipment inventory listing
- [3]Equipment inventory listing
- [4]Inventory photo
- [5]fabsurplus.com — fabsurplus.comfabsurplus.com
- [6]Equipment inventory listing
Last updated Aug 14, 2026.
