Applied Materials
Producer GT DARC
Applied Materials Producer GT DARC is a PECVD system. Applied Materials Producer GT DARC has three channels. Applied Materials Producer GT DARC has four FOUP ports.[1][2]
What it is
How it works
The Applied Materials Producer GT DARC is configured with 3 channels. The Applied Materials Producer GT DARC uses SiH4, N2O, and NH3 process gases. The Applied Materials Producer GT DARC is equipped with 4 FOUP ports. The Applied Materials Producer GT DARC includes an SMC HRW008-H1S-DY-X007 chiller. The Applied Materials Producer GT DARC includes six Advanced Energy Apex 3013 power supplies. The Applied Materials Producer GT DARC includes six Advanced Energy /PDX 900 power supplies. The Applied Materials Producer GT DARC includes six MKS Astron 2L power supplies.[2][1]
Where it fits in the process flow
General reference — not yet source-verifiedDeposition tools of this class are used after surface preparation steps when a dielectric or related film must be added to the wafer. Deposition tools of this class are followed by patterning, etch, metrology, or additional film-stack steps, depending on the device flow.
Applications
What do the numbers mean?
Power & electrical6
Gas & chemistry3
Configuration & options10
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- GasSiH4, N2O, NH3[1]
- ConfigurationAdvanced Energy Apex 3013 Power Supply (x6)[1]
- ConfigurationAdvanced Energy /PDX 900 Power Supply (x6)[1]
- ConfigurationMKS Astron 2L Power supply (x6)[1]
- Process gasesSiH4, N2O, NH3[1]
- Power supply type 1Advanced Energy Apex 3013 (x6)[2]
- Power supply type 2Advanced Energy /PDX 900 (x6)[2]
- Power supply type 3MKS Astron 2L (x6)[2]
- TypePECVD (Plasma-Enhanced Chemical Vapor Deposition) system[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Producer GT DARC are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Producer GT DARC are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Producer GT DARC are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Producer GT DARC are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Producer GT DARC are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Producer GT DARC is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 16, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.