Applied Materials

VIISta 80 High Current

Ion Implantation Laser Wafer Mapping Applied Materials VIISTA family

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VIISta 80 High Current — Inventory photo — Fig. 01VIISta 80 High CurrentInventory photo^[1]

Wafer size

Laser Wafer Mapping

Power

3 Phase, 208 V^[1]

Vacuum

UES with Turbo Foreline^[1]

Gas delivery

Gas Box:^[1]

What it is

The Applied Materials / Varian VIISta 80 is a high-current ion implanter. The VIISta 80 processes wafers of 200 mm diameter. The system was manufactured in the early 2000s.^[1]^[3]

What do the numbers mean?

Power & electrical2

Line Voltage: 3 Phase, 208 V^[1]
Line Frequency: 50 / 60 Hz^[1]

Vacuum & pumping3

Type: UES with Turbo Foreline^[1]; Pump Options:^[1]
Loadlock / Cassette: 2 chambers, UES with Turbo Foreline; Cassette Stage 200 mm (8") Standard with Laser Wafer Mapping^[1]

Wafer handling5

Loadlock / Cassette:^[1]
Cassette Stage: 200 mm (8") Standard^[1]
Wafer size: Laser Wafer Mapping^[1]; Transfer Chamber^[1]
Wafer Size: 200 mm (8 inch)^[1]

Gas & chemistry4

Gas Box:^[1]
He MFC Size: Optional^[1]
N 2 MFC Size: 1 slm (for 500 sccm in the recipe)^[1]
Gas Box: 5 sticks, HP and SDS 2 in use; He MFC optional; N2 MFC 1 slm^[1]

Configuration & options12

UPS: EATON 9 PX 3000^[1]; Chamber A - DPN (Aluminum)^[1]; 5 Sticks, HP and SDS 2 in use^[1]; Chambers (2)^[1]; Status Light Tower:^[1]
Lamp Colors: Red, Orange, Green^[1]; Heat Exchanger / Chiller:^[1]
Chiller: Affinity RAA 012 K CE 55 CBC^[1]
DI Cart: VIISta 80 with B-Pure Filters^[1]
Manufacturer: Applied Materials / Varian^[2]
Model: VIISta 80^[2]
Vintage: 2000^[1]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Line Voltage3 Phase, 208 V^[1]
Line Frequency50 / 60 Hz^[1]
ConfigurationGas Box:^[1]
He MFC SizeOptional^[1]
N 2 MFC Size1 slm (for 500 sccm in the recipe)^[1]
TypeUES with Turbo Foreline^[1]
ConfigurationPump Options:^[1]
Gas Box5 sticks, HP and SDS 2 in use; He MFC optional; N2 MFC 1 slm^[1]
Loadlock / Cassette2 chambers, UES with Turbo Foreline; Cassette Stage 200 mm (8") Standard with Laser Wafer Mapping^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the VIISta 80 High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta 80 High Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta 80 High Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta 80 High Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta 80 High Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta 80 High Current is not on record.
Answerable by: an OEM datasheet or a fab qualification report