Tool family
The Applied Materials / Varian VIISta 80 is a high current ion implanter designed for 200 mm wafer processing.
The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.
Applied Materials / Varian VIISta HCP+ is a 12-inch high current ion implanter.
The Applied Materials / Varian VIISta HCS Ion Implanter is an ion implanter described as a 1-channel SCCM-type system with 6 gas lines.
The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.
Applied Materials / Varian VIISta Plad is a high current ion implanter with a 12-inch wafer size.
The Applied Materials / Varian VIISta 80 is a high current ion implanter designed for 200 mm wafer processing.
The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.
Applied Materials / Varian VIISta HCP+ is a 12-inch high current ion implanter.
The Applied Materials / Varian VIISta HCS Ion Implanter is an ion implanter described as a 1-channel SCCM-type system with 6 gas lines.
The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.
Applied Materials / Varian VIISta Plad is a high current ion implanter with a 12-inch wafer size.