ASML
PAS 2000
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The PAS 2000 is a wafer stepper that was ASML's first lithography product. The PAS 2000 used oil pressure to move the wafer, which caused leakage. The PAS 2000 achieved a critical dimension between 1.0 and 1.3 micron and an overlay accuracy of 0.25 micron.[1][2][3]
How it works
Applications
- Production of integrated circuits
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Commercial and technical failure
- Oil-pressure wafer movement had a tendency to leak
What do the numbers mean?
Vacuum & pumping3
Performance1
Dimensions & facilities1
Configuration & options1
Vintage & configurations
What replaced it?
Related models
- successorASML PAS 5500— ASML developed the PAS 5500 after the PAS 2000; the PAS 5500 became the company's first commercial breakout.source[1]
- successorASML PAS 2400— The PAS 2400 was an improvement over the PAS 2000, which had used oil pressure and was a commercial and technical failure.source[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What was the ASML PAS 2000?
The ASML PAS 2000 was ASML's first product, a wafer stepper used in semiconductor photolithography.[1][2]
When was the PAS 2000 introduced?
The PAS 2000 was introduced in 1984.[3]
Not publicly documented
The following facts about the PAS 2000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the PAS 2000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PAS 2000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PAS 2000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 2000 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the PAS 2000 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]en.wikipedia.org — en.wikipedia.orgen.wikipedia.org
- [2]chiphistory.org — chiphistory.orgchiphistory.org
- [3]PAS 2000 — ASML | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [4]PAS 2000 Wafer Stepper by ASML product specification & brochure — chiphistory.orgchiphistory.org
Last updated Oct 10, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
