ASML

PAS 2500

LithographyProduced 1985–

Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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Produced

1985–

Optics

900 nm^[3]

What it is

General reference — not yet source-verified

The ASML PAS 2500 is a wafer stepper, a type of photolithography machine used in semiconductor manufacturing to project a reticle pattern onto a photosensitive-coated wafer. Steppers expose the wafer in a step-and-repeat fashion, building up the circuit pattern layer by layer.

How it works

The PAS 2500/10 stepper, introduced in 1986, could image lines of 900 nanometers and place successive layers with an overlay accuracy of 250 nanometers. The maximum wafer size handled was 150 millimeters, and the production capacity reached 66 wafers of that size per hour.^[3]

Where it fits in the process flow

General reference — not yet source-verified

In a semiconductor fab, the PAS 2500 is used in the photolithography cell, a critical process step. The machine receives wafers that have been cleaned and coated with a photoresist layer. After exposure, the wafers are sent to develop tracks where the exposed resist is removed, and then to etch or deposition tools to transfer the pattern into the underlying layers.

What do the numbers mean?

Wafer handling3

Wafer size (base model): 5 inches^[2]
Throughput (PAS 2500/10): 66 wafers per hour (150 mm)^[3]
Wafer size (PAS 2500/40): 150 mm (6 inches)^[4]

Optics & imaging6

Resolution (PAS 2500/10): 900 nm^[3]
Overlay accuracy (PAS 2500/10): 250 nm^[3]
Reticle masking (PAS 2500/40): Four independent blades; full field of travel^[4]
Alignment system (PAS 2500/40): Dual automatic through-the-lens using diffraction grating marks directly referenced to reticle alignment system^[4]
Illumination system (PAS 2500/40): Elliptical mirror and fly's eye integrator^[4]
Position control (PAS 2500/40): Three axis HP laser interferometer system^[4]

Vintage & configurations

1985-06-30Production start^[1]
Introduction of the PAS 2500 series.

Documented models & variants

Designation	Generation	Vintage	Changes	Source
PAS 2500/10	—	1986	First model in the PAS 2500 series; 150 mm wafer size; 900 nm resolution; 250 nm overlay accuracy; 66 wafers per hour throughput.	steendrukmuseum.nl^[3]
PAS 2500/40	—	—	150 mm wafer size; reticle masking with four independent blades; dual automatic through-the-lens alignment; elliptical mirror and fly's eye integrator illumination; three axis HP laser interferometer position control.	semistarcorp.com^[4]

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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the minimum resolution of the PAS 2500/10?

The PAS 2500/10 can image lines of 900 nanometers.^[3]

What is the overlay accuracy of the PAS 2500/10?

The overlay accuracy is 250 nanometers.^[3]

What is the throughput of the PAS 2500/10?

The production capacity is a maximum of 66 wafers of 150 mm per hour.^[3]

How does the alignment system work on the PAS 2500/40?

The PAS 2500/40 uses a dual automatic through-the-lens alignment system that references diffraction grating marks directly to the reticle alignment system.^[4]

Not publicly documented

The following facts about the PAS 2500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

The control-system platform and OS era of the PAS 2500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the PAS 2500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the PAS 2500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 2500 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the PAS 2500 are on record.
Answerable by: university cleanroom staff or an OEM application specialist