XT 1900 Gi

The ASML XT 1900 Gi is a lithography scanner for semiconductor wafer patterning. Lithography scanners project a reticle pattern onto photoresist-coated wafers during chip manufacturing. Lithography scanners are used to define repeated device layers with optical exposure rather than full-field contact or proximity printing.

Lithography scanners expose photoresist by projecting patterned light through reduction optics while the reticle and wafer move in a synchronized scan. Immersion lithography places a liquid between the final projection lens and the wafer to increase numerical aperture and extend optical resolution. Scanner architectures are used for high-precision overlay and repeated exposure across many die sites on a wafer.

Lithography scanners sit in the pattern-transfer portion of wafer fabrication. Lithography exposure follows wafer coating and bake steps and precedes development, pattern inspection, and etch or implant steps. Repeated lithography cycles are used across many layers of logic and memory process flows.

Optical lithography scanners are used to print patterned layers in integrated circuit fabrication. Such tools are applied to layers that require precise imaging and alignment between successive process levels. Immersion scanners are used where optical resolution and overlay control are important for dense device features.