NV 6200 A Ion

The Axcelis NV 6200 A Ion is an ion implanter made by Axcelis. The Axcelis NV 6200 A Ion is categorized under ion implantation equipment. The Axcelis NV 6200 A is configured for 6 inch wafers.^[1][2]

Ion implanters introduce selected dopant ions into a wafer by generating ions from a source gas, extracting and accelerating the ions, and directing the beam onto the wafer surface. Ion implanters use mass analysis and beamline control to select the desired ion species and energy before implantation. Ion implanters are used when semiconductor fabrication requires controlled modification of electrical properties within patterned regions of a device.

Ion implantation tools are used during front end device formation after lithographic patterning has defined regions for doping. Ion implantation commonly occurs between film formation, masking, and later thermal steps that activate dopants and repair implantation damage. Ion implantation supports repeated introduction of different dopant conditions across the device flow as wells, source and drain regions, and related structures are formed.

Ion implanters are used for semiconductor doping processes that require controlled placement of impurity species in silicon and related substrates. Ion implantation supports formation of transistor regions, isolation related doping steps, threshold adjustment work, and other junction engineering tasks. Ion implantation is also used where a process flow benefits from directional, dose controlled introduction of dopants through patterned openings.