Canon
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The Canon FPA 2500 i 2 is a stepper for semiconductor lithography. The Canon FPA 2500 i 2 has been observed in configurations with 6-inch and 8-inch wafer sizes. The Canon FPA 2500 i 2 was produced with vintage years of 1993 and 1994.[1][2]

Documented failure modes, common issues, and field considerations.
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Yes, the FPA 2500 i 2 is a stepper.[1]
The following facts about the FPA 2500 i 2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the FPA 2500 i 2 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FPA 2500 i 2 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the FPA 2500 i 2 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the FPA 2500 i 2 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the FPA 2500 i 2 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Aug 20, 2026.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.