Hitachi
S 3200 N
What it is
The Hitachi S 3200 N is a scanning electron microscope (SEM) used for metrology and inspection applications.[1][2]
The system includes a Robinson backscattered electron (BSE) detector.[1][2]
How it works
General reference — not yet source-verifiedThe S 3200 N forms an image by scanning a focused electron beam across the sample surface and detecting the signals produced by electron-matter interactions.
Where it fits in the process flow
General reference — not yet source-verifiedScanning electron microscopes of this class are used in semiconductor fabrication for high-magnification inspection and metrology of micro-scale features on wafers and devices.
In a fab environment, such an SEM is commonly employed for failure analysis, process development, and quality control, examining cross-sections or surface topography alongside complementary techniques like EDX for elemental composition.
Applications
General reference — not yet source-verifiedThe S 3200 N is used for imaging sample surfaces at high magnification, with both secondary electron and backscattered electron detection for topographical and compositional contrast.
What do the numbers mean?
Vacuum & pumping2
- Two Vacuum Pumps[1]
Optics & imaging4
- Robinson Back Scatter Detector[1]
Control & software2
Configuration & options8
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Hitachi S 3200 N?
The Hitachi S 3200 N is a scanning electron microscope.[1][2]
Does the Hitachi S 3200 N support backscattered electron detection?
The Hitachi S 3200 N procedure refers to a BSE Robinson detector and notes that the B monitor is normally used for the back scattered electron detector.[2][1]
What working distance is used in the operating procedure?
The Hitachi S 3200 N procedure sets the working distance to 15 mm during imaging and also sets the working distance to 15 mm for EDX.[2]
Not publicly documented
The following facts about the S 3200 N are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 3200 N are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 3200 N are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 3200 N are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the S 3200 N are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the S 3200 N is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]uol.de — uol.deuol.de
Last updated Oct 16, 2026.
Compare with similar tools
View all →The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
