S 5000

A scanning electron microscope is a metrology and inspection instrument that forms images by scanning a focused electron beam across a sample and detecting emitted signals from the surface region. A field emission scanning electron microscope is typically used when higher beam brightness and finer probe formation are needed for detailed surface observation and dimensional review.

The Hitachi S 5000 uses a cold field emission source. The Hitachi S 5000 has a three-stage electromagnetic lens system. The Hitachi S 5000 has a two-stage electromagnetic scanning coil. The Hitachi S 5000 has an octapole electromagnetic stigmatior of X and Y type. The Hitachi S 5000 has an objective aperture with four openings that is selectable and alignable from outside the vacuum, and the objective aperture includes a built-in anticontamination heater. The Hitachi S 5000 uses a side entry specimen stage system. The Hitachi S 5000 uses airlock specimen exchange with prepumping.^[4]

The Hitachi S 5000 has resolution of 0.6 nm at 30 kV in secondary electron image mode and 3.5 nm at 1 kV. The Hitachi S 5000 provides 30 to 500x magnification in low magnification mode and 250 to 800,000x magnification in high magnification mode. The Hitachi S 5000 provides accelerating voltage from 0.5 to 30 kV in 100 V steps.^[4]

A scanning electron microscope sits in characterization, failure analysis, and process-monitoring flows rather than in the main production path that modifies the wafer. A scanning electron microscope is commonly used after patterning, etch, deposition, cleaning, or material growth steps when engineers need direct visual evidence of surface condition, profile behavior, or defect morphology. A scanning electron microscope can also be used after electrical or reliability screening to inspect physical features associated with observed failures.

The Hitachi S 5000 accepts a standard holder specimen size of 9.5 mm by 5 mm by 2.4 mm height and a large specimen holder size of 20 mm by 6 mm by 2.4 mm height. The Hitachi S 5000 stage motion is X plus or minus 3.5 mm continuous, Y plus or minus 2 mm continuous, and tilt plus or minus 40 degrees continuous, with tilt restricted by optional specimen holders and optional detectors.^[4]