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Hitachi

S 9300

Metrology & InspectionHitachi S 9300 family
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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Hitachi S-9300 is a CD-SEM (critical dimension scanning electron microscope) for semiconductor metrology. The S-9300 supports both 200mm and 300mm wafers through a conversion kit. The S-9300 achieves a resolution of 3nm at 800V using retarding/boosting mode.[1]

Hitachi logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Power

6kVA Single Phase[3]

Gas delivery

Nitrogen, Oil free Air (OFA), PCW Glycol[1]

Optics

1000x to >300000x[1]

What it is

The Hitachi S 9300 is a scanning electron microscope used for metrology and inspection in semiconductor manufacturing.[2][3]

How it works

The Hitachi S 9300 uses a Schottky emission source, an electromagnetic lens system, and electromagnetic scan and deflection elements to form and steer the electron beam.[1]

Where it fits in the process flow

General reference — not yet source-verified

The Hitachi S 9300 fits in wafer inspection and metrology after pattern formation, where the tool evaluates printed structures on processed wafers.

Applications

The Hitachi S 9300 is used for semiconductor wafer imaging, critical-dimension measurement, and surface inspection.[4][1]

What do the numbers mean?

Power & electrical5

Power requirement
6kVA Single Phase[3]
Accurate?
Accelerating voltage
500V to 1600V, 10V steps[1]
Accurate?
Electromagnetic Lens
3-Stage Electromagnetic Lens with boosting voltage[1]
Accurate?
Field control method
Continuously on for sample decharging at all voltages[1]
Accurate?
Resolution
3nm (800V) Retarding/Boosting Mode[1]
Accurate?

Vacuum & pumping1

Objective Lens
4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[1]
Accurate?

Wafer handling8

Wafer Size
200mm & 300mm[3]
Accurate?
Wafer Size (CD SEM specification)
200mm[1]
Accurate?
Wafer Imaging
X coverage from 5 – 295mm, Y coverage from 5 – 195mm[1]
Accurate?
Wafer imaging ability
Entire surface of 8” or 12” wafer[1]
Accurate?
Wafer Handling System
200mm Wafer Handling System, (2) Cassette holders with ergo flippers, Convertible to 300mm with conversion kit[1]
Accurate?
Wafer size
200mm and 300mm[3]
Accurate?
Wafer size
200mm[1]
Accurate?
Wafer Handling
200mm cassette holders with ergo flippers; convertible to 300mm with conversion kit[1]
Accurate?

Gas & chemistry1

Chemicals Used
Nitrogen, Oil free Air (OFA), PCW Glycol[1]
Accurate?

Optics & imaging4

Magnification
1000x to >300000x[1]
Accurate?
Depth of focus
≥ 1.0um at 80000x magnification[1]
Accurate?
Optical Microscope System
Monochrome Image using CCD camera, 110x Magnification[1]
Accurate?
Depth of Focus
≥1.0µm at 80000x magnification[1]
Accurate?

Control & software6

Components
Main unit, Supply unit, Control unit[3]
Accurate?
Operating System
Unix version HP-UX 10.20 or newer[1]
Accurate?
Software Version
14.71 or newer[1]
Accurate?
SECS/GEM Communication Interface
Yes[1]
Accurate?
Control system OS
Unix version HP-UX 10.20 or newer[1]
Accurate?
Operating System
Unix HP-UX 10.20 or newer[1]
Accurate?

Configuration & options21

Model
S-9300[2]
Accurate?
Type
Scanning Electron Microscope (SEM)[2]
Accurate?
Year of manufacture
09-1999[3]
Accurate?
Serial number
0301-03[3]
Accurate?
Vintage
1996[2]
Accurate?
Electron Gun
Schottky emission source[1]
Accurate?
Field of view
1.2mm[1]
Accurate?
Probe Current
4~24pA with automated setting and measurement by Faraday cup[1]
Accurate?
Scan Coil
2-Stage Electromagnetic Deflection[1]
Accurate?
Astigmatism correction
via 8-pole electromagnetic coil[1]
Accurate?
Workstation Model
HP B180L (9GB)[1]
Accurate?
Dual XY Hitachi Microscale
Yes[1]
Accurate?
DSP Image Processing
Yes[1]
Accurate?
BSE Mode
Yes[1]
Accurate?
Multipoint Measurement Function
Yes[1]
Accurate?
Edge Roughness Function
Yes[1]
Accurate?
Automated Image Archiving Function
Yes[1]
Accurate?
Equipment type
Scanning Electron Microscope[2]
Accurate?
System type
CD-SEM system[4]
Accurate?
Workstation
HP B180L (9GB)[1]
Accurate?
Probe Current
4~24pA with automated setting[1]
Accurate?
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Power requirement6kVA Single Phase[3]
  • Accelerating voltage500V to 1600V, 10V steps[1]
  • Electromagnetic Lens3-Stage Electromagnetic Lens with boosting voltage[1]
  • Objective Lens4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[1]
  • Field control methodContinuously on for sample decharging at all voltages[1]
  • Resolution3nm (800V) Retarding/Boosting Mode[1]
  • Chemicals UsedNitrogen, Oil free Air (OFA), PCW Glycol[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

What kind of data does this class of machine provide?General reference — not yet source-verified

Depending on the sensing method, it can provide images, dimensional measurements, surface-condition information, or defect-location data.

What kinds of samples are inspected?General reference — not yet source-verified

Such systems are used on semiconductor and other precision-manufactured parts with small features, fine patterns, or sensitive surface conditions.

Not publicly documented

The following facts about the S 9300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 9300 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the S 9300 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the S 9300 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the S 9300 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the S 9300 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]fabsurplus.com — fabsurplus.comfabsurplus.com
  2. [2]Equipment inventory listing
  3. [3]ptwsingapore.com — ptwsingapore.comptwsingapore.com
  4. [4]classoneequipment.com — classoneequipment.comclassoneequipment.com
  5. [5]Equipment inventory listing
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Last updated Oct 11, 2026.

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