KLA
8100 CD-SEM
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The KLA 8100 CD-SEM is a critical dimension scanning electron microscope. The KLA 8100 CD-SEM is configured for 8 inch wafers.[1]
How it works
The 8100XP CD SEM performs fully automated cassette-to-cassette critical dimension measurements on silicon wafers and reticles. The 8100XP CD SEM has an electron optical design that allows bottom imaging of high aspect ratio structures and precise measurements for tight process control. The 8100-T CD SEM combines secondary and backscatter electron imaging for pattern recognition and focusing at zero throat. The 8100-T CD SEM can also perform reticle measurements.[3]
Where it fits in the process flow
General reference — not yet source-verifiedCD-SEM tools sit in the metrology flow around lithography and etch operations. CD-SEM measurements are commonly taken after pattern formation so engineers can verify printed dimensions and adjust exposure, development, or etch conditions in subsequent process runs.
Applications
The 8100XP CD SEM measures silicon wafers and reticles. The 8100XP-R CD SEM is optimized for reticle-specific applications. The 8100XP-R CD SEM provides a stable, repeatable imaging system for chrome-on-glass and phase shift masks. The 8100-T CD SEM is used for critical dimension measurement and thin film head imaging.[3]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Missing parts
What do the numbers mean?
Vacuum & pumping1
Wafer handling2
Dimensions & facilities1
Configuration & options4
- Missing parts[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- PumpsEdwards iQDP 40 (2)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the KLA 8100 CD-SEM?
The KLA 8100 CD-SEM is a critical dimension scanning electron microscope.[1]
Can the 8100 family measure reticles?
The 8100XP CD SEM performs fully automated cassette-to-cassette CD measurements on silicon wafers and reticles. The 8100-T CD SEM can also perform reticle measurements.[3]
Not publicly documented
The following facts about the 8100 CD-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 8100 CD-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 8100 CD-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 8100 CD-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 8100 CD-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 8100 CD-SEM are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.comwaferpedia.com
- [3]KLA-Tencor Web Site Products - Lithography - Product — tencor.com (Oct 9, 1999)web.archive.org
Last updated Oct 19, 2026.
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