Kurt Lesker

150LX

Deposition 150mm Kurt Lesker 150LX family

Research Quality: 40% complete

Kurt Lesker150LX

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What is it?

The source identifies the equipment as a Kurt Lesker ALD-150LX plasma-enhanced atomic layer deposition system located in a cleanroom. It is described as a load-locked system and as being equipped with an in situ ellipsometer system (Film Sense FS-1 Multi-Wavelength) for monitoring film growth.

What can it run?

Process applications and technology nodes documented for this tool.

Conformal fabrication of thin films
Atomic-scale thin-film deposition
Growth of Al2O3 films by thermal- or PE-ALD
Growth of HfO2 films by thermal- or PE-ALD
Growth of ZrO2 films by thermal- or PE-ALD
Growth of HfZrO2 films by thermal- or PE-ALD
Growth of TiN films by PE-ALD
Growth of Ga2O3 films by PE-ALD

What do the numbers mean?

Wafer handling1

Wafer size: Up to full 150 mm (6") wafers^[1]

Optics & imaging1

In situ metrology: Film Sense FS-1 Multi-Wavelength ellipsometer^[1]

Configuration & options5

OEM: Kurt Lesker^[1]
Model: ALD-150LX^[1]
Type: Plasma-enhanced atomic layer deposition (PE-ALD) system^[1]
Location: Cleanroom^[1]
Operating mode: Load-locked system^[1]

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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the 150LX are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 150LX are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 150LX are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 150LX are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 150LX are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 150LX is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources

[1]smif.pratt.duke.edu — smif.pratt.duke.edusmif.pratt.duke.edu
[2]Kurt J. Lesker Company | ALD-150LX Thin Film Deposition System | Enabling Technology for a Better World — lesker.comlesker.com
[3]PEALD Kurt J. Lesker 150LX | Materials Research Laboratory | Illinois — mrl.illinois.edumrl.illinois.edu
[4]KJLC 150LX Atomic Layer Deposition - Equipment - nanoFAB Confluence — confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca