Kurt Lesker

ALD-150LX

Deposition 150mm Kurt Lesker ALD-150LX family

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ALD-150LX — smif.pratt.duke.edu — Fig. 01ALD-150LXsmif.pratt.duke.edu^[1]

Wafer size

150mm

Optics

Film Sense FS-1 Multi-Wavelength^[1]

What is it?

The Kurt Lesker ALD-150LX is listed as a plasma-enhanced atomic layer deposition (PE-ALD) system. The source states that it is load-locked, and that it includes an in situ ellipsometer system (Film Sense FS-1 Multi-Wavelength) for monitoring film growth. It is described as supporting requested growth of Al2O3, HfO2, ZrO2, HfZrO2, TiN, and Ga2O3 films, with substrate specs including no exposed organics, no exposed high-outgassing materials, and up to full 150 mm wafers.

What can it run?

Process applications and technology nodes documented for this tool.

Plasma-enhanced atomic layer deposition
Conformal fabrication of thin films with atomic-scale control
Growth of requested oxide, nitride, and oxide-related films

What do the numbers mean?

Wafer handling3

Substrate specification: No exposed organics such as polymers^[1]
Substrate specification: No exposed materials with high outgassing properties^[1]
Small samples: Able to be clipped to wafer carrier^[1]

Optics & imaging2

In situ ellipsometer: Film Sense FS-1 Multi-Wavelength^[1]
Maximum film thickness stated: up to 20 nm^[1]

Configuration & options4

OEM: Kurt Lesker^[2]
Model: ALD-150LX^[2]
Load-locked: Yes^[1]
Available film growth by request: Al2O3, HfO2, ZrO2, HfZrO2, TiN, Ga2O3^[1]

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Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the ALD-150LX are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ALD-150LX are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ALD-150LX are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ALD-150LX are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ALD-150LX are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ALD-150LX is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources

[1]smif.pratt.duke.edu — smif.pratt.duke.edusmif.pratt.duke.edu
[2]smif.pratt.duke.edu — smif.pratt.duke.edusmif.pratt.duke.edu

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Last updated Jul 29, 2026.

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150LXKurt Lesker

The Kurt Lesker ALD-150LX is a plasma-enhanced atomic layer deposition system with a load-locked process chamber and in situ ellipsometer, configured for up to 150 mm wafers.

CategoryDepositionWafer150mm

7 specs

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