Lam Research
Alliance 6 4720 XL
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedEtch tools generally expose wafers to controlled process conditions that remove unprotected material while masked regions remain. Etch tools commonly rely on gas phase chemistry, plasma based reactions, or a combination of physical and chemical mechanisms to shape patterned layers. Multi chamber etch systems are generally built to carry wafers through dedicated process modules under controlled handling conditions.
Where it fits in the process flow
General reference — not yet source-verifiedEtch tools are used after a pattern has been formed in a resist or hard mask and before later film deposition, cleaning, or additional patterning steps. Etch tools sit within the repeated pattern transfer sequence that builds device structures layer by layer across the wafer.
Applications
General reference — not yet source-verifiedEtch tools are used to define features in dielectric, conductive, and semiconductor layers during integrated circuit fabrication. Etch tools are applied wherever selective material removal is needed to open contacts, shape interconnect levels, or form active device structures.
What do the numbers mean?
Wafer handling1
Configuration & options4
- 3 Chamber[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Alliance 6 4720 XL are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alliance 6 4720 XL are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alliance 6 4720 XL are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alliance 6 4720 XL are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alliance 6 4720 XL are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alliance 6 4720 XL is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Equipment inventory listing
Last updated Oct 16, 2026.
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